Method for forming multi-layer film and patterning process
First Claim
1. A method for forming a multi-layer film on a substrate, comprising the steps of:
- (i) forming an under layer film on the substrate by applying an under layer film material containing one or more species selected from the group consisting of resins having a repeating unit shown by the following general formula (1) in which a fluorene structure is contained, resins having a repeating unit shown by the following general formula (2) in which a fluorene structure is contained, and compounds shown by the following general formula (3) in which a fluorene structure is contained, and curing the same by heat treatment at a temperature of 300°
C. or higher and 800°
C. or lower for 10 to 4,000 seconds;
(ii) forming a titanium nitride film or a titanium oxynitride film on the under layer film;
(iii) forming a hydrocarbon film on the titanium nitride film or the titanium oxynitride film by applying a hydrocarbon film material; and
(iv) forming a silicon oxide film on the hydrocarbon film by applying a silicon oxide film material,
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Abstract
The present invention provides a method for forming a multi-layer film, including (i) forming an under layer film on a substrate by applying an under layer film material containing one or more species selected from resins having a repeating unit shown by the formula (1), resins having a repeating unit shown by the formula (2), and compounds shown by the formula (3), each containing a fluorene structure, and curing the same by heat treatment at 300° C. to 800° C. for 10 to 4,000 seconds; (ii) forming a titanium nitride film or a titanium oxynitride film on the under layer film; (iii) forming a hydrocarbon film on the titanium nitride film or the titanium oxynitride film; and (iv) forming a silicon oxide film on the hydrocarbon film. This can form a multi-layer film with reduced reflectance useful for a patterning process with high dimensional accuracy in dry etching.
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Citations
20 Claims
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1. A method for forming a multi-layer film on a substrate, comprising the steps of:
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(i) forming an under layer film on the substrate by applying an under layer film material containing one or more species selected from the group consisting of resins having a repeating unit shown by the following general formula (1) in which a fluorene structure is contained, resins having a repeating unit shown by the following general formula (2) in which a fluorene structure is contained, and compounds shown by the following general formula (3) in which a fluorene structure is contained, and curing the same by heat treatment at a temperature of 300°
C. or higher and 800°
C. or lower for 10 to 4,000 seconds;(ii) forming a titanium nitride film or a titanium oxynitride film on the under layer film; (iii) forming a hydrocarbon film on the titanium nitride film or the titanium oxynitride film by applying a hydrocarbon film material; and (iv) forming a silicon oxide film on the hydrocarbon film by applying a silicon oxide film material, - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20)
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Specification