Method of fabricating optical devices using laser treatment
First Claim
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1. A method for forming optical devices comprising:
- providing a gallium and nitrogen containing substrate member having a crystalline surface region and a backside opposite the crystalline surface region;
forming a laser stripe region overlying a portion of the crystalline surface region;
subjecting the backside to a laser scribing process to form a plurality of scribe regions on the backside, at least one of the plurality of scribe regions underlying at least a portion of the laser stripe region, each of the plurality of scribe regions comprising a recessed region extending partially through a thickness of the gallium and nitrogen containing substrate, wherein portions of the backside within a vicinity of the plurality of scribe regions have a higher conductivity than portions of the backside outside the vicinity of the plurality of scribe regions;
forming a metallization material overlying the backside including at least a portion of the plurality of scribe regions; and
removing at least one optical device from the gallium and nitrogen containing substrate member using at least one of the plurality of scribe regions.
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Abstract
A method for forming optical devices. The method includes providing a gallium nitride substrate member having a crystalline surface region and a backside region. The method also includes subjecting the backside region to a laser scribing process to form a plurality of scribe regions on the backside region and forming a metallization material overlying the backside region including the plurality of scribe regions. The method removes at least one optical device using at least one of the scribe regions.
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Citations
19 Claims
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1. A method for forming optical devices comprising:
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providing a gallium and nitrogen containing substrate member having a crystalline surface region and a backside opposite the crystalline surface region; forming a laser stripe region overlying a portion of the crystalline surface region; subjecting the backside to a laser scribing process to form a plurality of scribe regions on the backside, at least one of the plurality of scribe regions underlying at least a portion of the laser stripe region, each of the plurality of scribe regions comprising a recessed region extending partially through a thickness of the gallium and nitrogen containing substrate, wherein portions of the backside within a vicinity of the plurality of scribe regions have a higher conductivity than portions of the backside outside the vicinity of the plurality of scribe regions; forming a metallization material overlying the backside including at least a portion of the plurality of scribe regions; and removing at least one optical device from the gallium and nitrogen containing substrate member using at least one of the plurality of scribe regions. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11)
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12. A method for forming optical devices comprising:
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providing a gallium and nitrogen containing substrate member having a crystalline surface region and a backside opposite the crystalline surface region; subjecting the backside to a laser scribing process to form a plurality of ablated regions characterized by a v-shaped or a trench-shaped profile on the backside of the gallium and nitrogen containing substrate, where sides and a bottom of the plurality of ablated regions have a higher gallium concentration than surfaces of the backside of the gallium and nitrogen containing substrate that are laterally spaced from the plurality of ablated regions; forming a metal contact on the backside of the gallium and nitrogen containing substrate that covers at least a portion of the plurality of ablated regions; and removing at least one optical device from the gallium and nitrogen containing substrate member using at least one of the plurality of ablated regions. - View Dependent Claims (13, 14, 15, 16, 17)
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18. A method for forming optical devices comprising:
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providing a gallium and nitrogen containing substrate member having a crystalline surface region and a backside opposite the crystalline surface region, the crystalline surface region configured in a non-polar or semi-polar orientation; forming one or more active regions overlying a portion of the crystalline surface region, the one or more active regions configured to emit electromagnetic radiation for an optical device; forming a metallization material overlying the crystalline surface region; subjecting the crystalline surface region to a laser treatment process to change an operating voltage of the optical device from a first value to a second value, the second value being less than the first value by at least 10 percent, the laser treatment process also causing formation of at least one scribe region on the surface region, the at least one scribe region comprising a recessed region extending through the crystalline surface region and partially through the gallium and nitrogen containing substrate, wherein portions of the crystalline surface region within a vicinity of the at least one scribe region have a higher conductivity than portions of the crystalline surface region outside the vicinity of the at least one scribe region; and removing the optical device using the at least the scribe region. - View Dependent Claims (19)
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Specification