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Method and system to reduce outgassing in a reaction chamber

  • US 9,790,595 B2
  • Filed: 01/27/2015
  • Issued: 10/17/2017
  • Est. Priority Date: 07/12/2013
  • Status: Active Grant
First Claim
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1. A method of reducing outgassing of a substance, the method comprising the steps of:

  • providing a gas-phase reactor comprising a reaction chamber, the reaction chamber comprising a surface having hygroscopic material deposited thereon;

    before providing a substrate within the reaction chamber, forming a barrier layer comprising one or more of TiO2, HfO2, SiO2, TiN, TiON, and TiC on the surface having hygroscopic material deposited thereon to mitigate outgassing of one or more gasses absorbed or adsorbed by the hygroscopic material;

    providing the substrate within the reaction chamber;

    depositing the hygroscopic material comprising one or more of lanthanum oxide, magnesium oxide, barium oxide, and strontium oxide onto a surface of the substrate within the reaction chamber, wherein depositing the hygroscopic material further comprises providing a scavenging precursor to the reaction chamber to react with material on a surface of the reaction chamber;

    removing the substrate from the reaction chamber;

    providing another substrate within the reaction chamber; and

    depositing hygroscopic material onto the another substrate and removing the another substrate before repeating the step of forming a barrier layer comprising the one or more of TiO2, HfO2, SiO2, TiN, TiON, and TiC,wherein the scavenging precursor is substantially consumed prior to reaching the substrate.

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