Resistive random access memory device
First Claim
1. A memory architecture, comprising:
- a first memory macro comprising a first plurality of memory cells;
a second memory macro comprising a second plurality of memory cells; and
a control logic, coupled to the first and second memory macros, and configured to transition each of the first and second pluralities of memory cells to either a first or a second logical state by using first and second signal levels, respectively, thereby causing the first and second memory macros to have first and second endurances, respectively, the first and second signal levels being different and the first and second endurances being different,wherein the first and second memory macros are formed on a single chip, and wherein the first and second pluralities of the memory cells comprise a variable resistance dielectric layer formed using a single process recipe, andwherein the first endurance comprises a maximum number of cycles for which the first plurality of memory cells can transition between the first and second logical states, and the second endurance comprises a maximum number of cycles for which the second plurality of memory cells can transition between the first and second logical states.
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Abstract
A memory architecture comprises a first memory macro comprising a first plurality of memory cells, a second memory macro comprising a second plurality of memory cells, and a control logic coupled to the first and second memory macros. The control logic is configured to write a logical state to each of the first and second pluralities of memory cells by using first and second signal levels, respectively, thereby causing the first and second memory macros to be used in first and second applications, respectively, the first and second signal levels being different and the first and second applications being different. The first and second memory macros are formed on a single chip, and wherein the first and second pluralities of the memory cells comprise a variable resistance dielectric layer formed using a single process recipe.
46 Citations
20 Claims
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1. A memory architecture, comprising:
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a first memory macro comprising a first plurality of memory cells; a second memory macro comprising a second plurality of memory cells; and a control logic, coupled to the first and second memory macros, and configured to transition each of the first and second pluralities of memory cells to either a first or a second logical state by using first and second signal levels, respectively, thereby causing the first and second memory macros to have first and second endurances, respectively, the first and second signal levels being different and the first and second endurances being different, wherein the first and second memory macros are formed on a single chip, and wherein the first and second pluralities of the memory cells comprise a variable resistance dielectric layer formed using a single process recipe, and wherein the first endurance comprises a maximum number of cycles for which the first plurality of memory cells can transition between the first and second logical states, and the second endurance comprises a maximum number of cycles for which the second plurality of memory cells can transition between the first and second logical states. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10)
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11. A resistive random access memory (RRAM) architecture, comprising:
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a first RRAM cell array comprising a first plurality of RRAM cells; a second RRAM cell array, comprising a second plurality of RRAM cells, and coupled to the first RRAM cell array; a bit line (BL) driver coupled to the first and second RRAM cell arrays; and a control logic, coupled to the first RRAM cell array, the second RRAM cell array, and the BL driver, and configured to transition each of the first and second pluralities of RRAM cells to either a first or a second logical state through the BL driver by using first and second signal levels, respectively, thereby causing the first and second RRAM cell arrays to have first and second endurances, respectively, the first and second signal levels and the first and second endurances being different, wherein the first and second RRAM cell arrays are formed as an RRAM macro on a single chip, and wherein the first and second pluralities of the RRAM cells comprise a substantially identical variable resistance dielectric layer, and wherein the first endurance comprises a maximum number of cycles for which the first plurality of RRAM cells can transition between first and second logical states, and the second endurance comprises a maximum number of cycles for which the second plurality of memory cells can transition between the first and second logical states. - View Dependent Claims (12, 13, 14, 15, 16, 17)
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18. A method of forming a memory, comprising:
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providing at least two cell arrays; providing a universal variable resistance dielectric layer on the at least two cell arrays; selecting a first cell array to have a first endurance; selecting a second cell array to have a second endurance; transitioning the first cell array to either a first or a second logical state using a first signal level; and transitioning the second cell array to either the first or the second logical state using a second signal level. - View Dependent Claims (19, 20)
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Specification