Method for positioning wafers in multiple wafer transport

• US 9,793,148 B2
• Filed: 06/22/2011
• Issued: 10/17/2017
• Est. Priority Date: 06/22/2011
• Status: Active Grant

• Current Assignee: ASM Japan K.K. (ASM International NV)
• Original Assignee: ASM Japan K.K. (ASM International NV)
• Inventors: Yamagishi, Takayuki, Suwada, Masaei, Tanaka, Hiroyuki
• Primary Examiner(s): Louie, Mandy
• Application Number:
  US13/166,367
• Publication Number:
  US 20120325148A1
• Time in Patent Office: 2,309 Days
• Field of Search: None
• CPC Class Codes: H01L 21/681 using optical controlling means
• CPC Class Codes: H01L 21/68742 characterised by a lifting arrangement, e.g. lift pins

Abstract

A method for positioning wafers in dual wafer transport, includes: simultaneously moving first and second wafers placed on first and second end-effectors to positions over lift pins protruding from first and second susceptors, respectively; and correcting the positions of the first and second wafers without moving any of the lift pins relative to the respective susceptors or without moving the lift pins relative to each other, wherein when the first and second wafers are moved to the respective positions, the distance between the first wafer and tips of the lift pins of the first susceptor is substantially smaller than the distance between the second wafer and tips of the lift pins of the second susceptor.

Claims

1. A method for positioning wafers in dual wafer transport, comprising:

(i) placing first and second wafers on first and second end-effectors of a fixed-fork-shaped blade of a wafer-handling robot, wherein the first end-effector is disposed on a plane substantially lower than a plane on which the second end-effector is disposed;

(ii) simultaneously moving the first and second wafers placed on the first and second end-effectors to positions over lift pins protruding from first and second susceptors, respectively, wherein a height of the lift pins protruding from the first susceptor is substantially the same as a height of the lift pins protruding from the second susceptor; and

(iii) correcting the position of the first wafer and placing the first wafer on the lift pins of the first susceptor by lowering the fixed-fork-shaped blade, and then correcting the position of the second wafer and placing the second wafer on the lift pins of the second susceptor by further lowering the fixed-fork-shaped blade, without moving any of the lift pins relative to the respective susceptors or without moving the lift pins relative to each other,

wherein when the first and second wafers are moved to the respective positions in step (ii), a distance between the first wafer and tips of the lift pins of the first susceptor is substantially smaller than a distance between the second wafer and tips of the lift pins of the second susceptor.

2. The method according to claim 1, wherein two photosensors are provided adjacent to a gate through which the first wafer passes between steps (i) and (ii), and two photosensors are provided adjacent to a gate through which the second wafer passes between steps (i) and (ii), said method further comprising, between steps (ii) and (iii), determining deviations of the first and second wafers simultaneously relative to the first and second susceptors, respectively, based on the timing of each light beam from each photosensor being blocked by the first and second wafers, whereby the positions of the first and second wafers are corrected in step (iii).