Capacitor structures, decoupling structures and semiconductor devices including the same
First Claim
1. An integrated circuit device, comprising:
- a decoupling structure having a first capacitor and a second capacitor that is different from the first capacitor, the decoupling structure comprising;
a first plurality of conductive patterns that each extend in a vertical direction;
a second plurality of conductive patterns that each extend in the vertical direction;
a horizontally disposed unitary supporting structure that structurally supports the first plurality of conductive patterns and the second plurality of conductive patterns; and
a common electrode disposed between ones of the first plurality of conductive patterns and between ones of the second plurality of conductive patterns,wherein the first plurality of conductive patterns and the common electrode comprise electrodes of the first capacitor, and the second plurality of conductive patterns and the common electrode comprise electrodes of the second capacitor,wherein the first plurality of conductive patterns and the second plurality of conductive patterns are horizontally spaced apart from each other in a first direction with a separation region therebetween,wherein the decoupling structure is mounted on an underlying lower structure so that the lower structure and the decoupling structure are stacked in the vertical direction, and the unitary supporting structure comprises a plurality of openings when viewed from above, andwherein none of the plurality of openings extend into the separation region.
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Accused Products
Abstract
Decoupling structures are provided. The decoupling structures may include first conductive patterns, second conductive patterns and a unitary supporting structure that structurally supports the first conductive patterns and the second conductive patterns. The decoupling structures may also include a common electrode disposed between ones of the first conductive patterns and between ones of the second conductive patterns. The first conductive patterns and the common electrode are electrodes of a first capacitor, and the second conductive patterns and the common electrode are electrodes of a second capacitor. The unitary supporting structure may include openings when viewed from a plan perspective. The first conductive patterns and the second conductive patterns are horizontally spaced apart from each other with a separation region therebetween, and none of the openings extend into the separation region.
23 Citations
20 Claims
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1. An integrated circuit device, comprising:
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a decoupling structure having a first capacitor and a second capacitor that is different from the first capacitor, the decoupling structure comprising; a first plurality of conductive patterns that each extend in a vertical direction; a second plurality of conductive patterns that each extend in the vertical direction; a horizontally disposed unitary supporting structure that structurally supports the first plurality of conductive patterns and the second plurality of conductive patterns; and a common electrode disposed between ones of the first plurality of conductive patterns and between ones of the second plurality of conductive patterns, wherein the first plurality of conductive patterns and the common electrode comprise electrodes of the first capacitor, and the second plurality of conductive patterns and the common electrode comprise electrodes of the second capacitor, wherein the first plurality of conductive patterns and the second plurality of conductive patterns are horizontally spaced apart from each other in a first direction with a separation region therebetween, wherein the decoupling structure is mounted on an underlying lower structure so that the lower structure and the decoupling structure are stacked in the vertical direction, and the unitary supporting structure comprises a plurality of openings when viewed from above, and wherein none of the plurality of openings extend into the separation region. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15)
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16. A decoupling structure, comprising:
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a plurality of vertically disposed electrode patterns on a substrate, the plurality of electrode patterns comprising; first electrode patterns disposed along a first horizontal direction at a first interval; and second electrode patterns disposed along the first horizontal direction at a second interval, wherein the first electrode patterns and the second electrode patterns are spaced apart from each other in the first horizontal direction with a separation region therebetween, and the separation region has a width in the first horizontal direction greater than the first interval or the second interval; a unitary supporting structure at least partially surrounding respective sidewalls of the first electrode patterns and respective sidewalls of the second electrode patterns, wherein the unitary supporting structure comprises a plurality of openings when viewed from a plan perspective, and none of the plurality of openings extend into the separation region; and a common electrode disposed between ones of the first electrode patterns and between ones of the second electrode patterns. - View Dependent Claims (17, 18, 19, 20)
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Specification