Method and system of controlling conductive fluid flow during an electrosurgical procedure
First Claim
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1. A method comprising:
- flowing an electrically conductive fluid from at least one source lumen of an electrosurgical wand, the flowing with the electrosurgical wand in a first orientation;
sensing a change in orientation of the electrosurgical wand to a second orientation different than the first orientation, the sensing by a computer system; and
changing a control parameter associated with the electrically conductive fluid flow, the changing configured to compensate for changes in electrically conductive fluid flow from the at least one source lumen due to the change in orientation of the electrosurgical wand, and changing the control parameter by the computer system;
wherein both the step of flowing and the step of changing a control parameter associated with electrically conductive fluid flow define a flow rate configured to create plasma adjacent an active electrode of the electrosurgical wand while RF energy is supplied to the active electrode.
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Abstract
Controlling conductive fluid flow during an electrosurgical procedure. At least some of the example embodiments are methods including: flowing conductive fluid from a source lumen to a suction lumen of an electrosurgical wand, the flowing with the electrosurgical wand in a first orientation; sensing a change in orientation of the electrosurgical wand to a second orientation different than the first orientation; and changing a control parameter associated with the conductive fluid flow, the changing responsive to the change in orientation of the electrosurgical wand.
558 Citations
23 Claims
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1. A method comprising:
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flowing an electrically conductive fluid from at least one source lumen of an electrosurgical wand, the flowing with the electrosurgical wand in a first orientation; sensing a change in orientation of the electrosurgical wand to a second orientation different than the first orientation, the sensing by a computer system; and changing a control parameter associated with the electrically conductive fluid flow, the changing configured to compensate for changes in electrically conductive fluid flow from the at least one source lumen due to the change in orientation of the electrosurgical wand, and changing the control parameter by the computer system; wherein both the step of flowing and the step of changing a control parameter associated with electrically conductive fluid flow define a flow rate configured to create plasma adjacent an active electrode of the electrosurgical wand while RF energy is supplied to the active electrode. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11)
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12. A method comprising:
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flowing conductive fluid through at least one lumen on a distal end of an electrosurgical wand, while the electrosurgical wand is in a first orientation; sensing a change in orientation of the electrosurgical wand to a second orientation different than the first orientation, the sensing by an orientation sensor coupled to a handle of the wand; and changing a control parameter associated with the conductive fluid flow, the changing configured so as to compensate for a change in flow of the conductive fluid due to the change in orientation of the electrosurgical wand, and the changing the control parameter by a computer system in communication with the orientation sensor; wherein both the step of flowing and the step of changing a control parameter associated with conductive fluid flow define a flow rate, configured to form and maintain a vapor layer at an active electrode of the electrosurgical wand during periods of time when RF energy is supplied to the active electrode. - View Dependent Claims (13, 14, 15, 16, 17, 18, 19)
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20. A method comprising:
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orienting an electrosurgical wand so that a wand handle end and a wand distal end are at substantially the same elevation; flowing conductive fluid from a source lumen disposed adjacent the wand distal end; adjusting a flowrate of the conductive fluid to a desired flowrate; sensing a change in elevation between the handle end and the distal end, the sensing by an orientation sensor associated with the wand and wherein the change in elevation causes a change in the flowrate away from the desired flowrate; and changing a control parameter associated with the conductive fluid flow so as to compensate for the change in flowrate due to the change in elevation between the handle end and the distal end and return the flowrate closer to the desired flowrate wherein both the step of flowing and the step of changing a control parameter associated with conductive fluid flow define a flow rate, configured to form and maintain a vapor layer at an active electrode of the electrosurgical wand during periods of time when RF energy is supplied to the active electrode. - View Dependent Claims (21, 22, 23)
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Specification