Method and apparatus for depositing atomic layers on a substrate
First Claim
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1. A method for depositing a plurality of atomic layers on a substrate, the method comprising:
- supplying a precursor gas from an output face of a deposition head towards the substrate, the output face having a substantially rounded shape at least partly defining a movement path of the substrate;
rotating the deposition head, with a rotational frequency controlled by a driving controller, while supplying the precursor gas; and
moving the substrate along the movement path with a translational velocity controlled by a transportation controller to deposit the plurality of atomic layers while continuously rotating the deposition head in one direction of rotation,wherein the driving controller and transportation controller impart, in conjunction, different rates and/or directions of movement between the deposition head and substrate.
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Abstract
Method of depositing an atomic layer on a substrate. The method comprises supplying a precursor gas from a precursor-gas supply of a deposition head that may be part of a rotatable drum. The precursor gas is provided from the precursor-gas supply towards the substrate. The method further comprises moving the precursor-gas supply by rotating the deposition head along the substrate which in its turn is moved along the rotating drum.
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Citations
19 Claims
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1. A method for depositing a plurality of atomic layers on a substrate, the method comprising:
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supplying a precursor gas from an output face of a deposition head towards the substrate, the output face having a substantially rounded shape at least partly defining a movement path of the substrate; rotating the deposition head, with a rotational frequency controlled by a driving controller, while supplying the precursor gas; and moving the substrate along the movement path with a translational velocity controlled by a transportation controller to deposit the plurality of atomic layers while continuously rotating the deposition head in one direction of rotation, wherein the driving controller and transportation controller impart, in conjunction, different rates and/or directions of movement between the deposition head and substrate. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19)
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Specification