Gap waveguide structures for THz applications
First Claim
1. A scalable production method for fabrication of a microwave/millimeter wave device, said microwave/millimeter wave device operating at frequencies in the entire range of or one or more subranges of the frequency range between 1 GHz and 100 THz, and comprising the step of providing a metamaterial on a surface of said microwave/millimeter wave device, wherein the step of providing said metamaterial on said surface of the microwave/millimeter wave device involves the use of at least one polymer to fabricate a high-resolution structure, and subsequent metallization of the high-resolution structure.
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Abstract
A microwave/millimeter device having a narrow gap between two parallel surfaces of conducting material by using a texture or multilayer structure on one of the surfaces is disclosed. The fields are mainly present inside the gap, and not in the texture or layer structure itself, so the losses are small. The microwave/millimeter wave device further includes one or more conducting elements, such as a metallized ridge or a groove in one of the two surfaces, or a metal strip located in a multilayer structure between the two surfaces. The waves propagate along the conducting elements. At least one of the surfaces is provided with means to prohibit the waves from propagating in other directions between them than along the ridge, groove or strip. At very high frequency, the gap waveguides and gap lines may be realized inside an IC package or inside the chip itself.
19 Citations
21 Claims
- 1. A scalable production method for fabrication of a microwave/millimeter wave device, said microwave/millimeter wave device operating at frequencies in the entire range of or one or more subranges of the frequency range between 1 GHz and 100 THz, and comprising the step of providing a metamaterial on a surface of said microwave/millimeter wave device, wherein the step of providing said metamaterial on said surface of the microwave/millimeter wave device involves the use of at least one polymer to fabricate a high-resolution structure, and subsequent metallization of the high-resolution structure.
- 3. A microwave/millimeter wave device, said microwave/millimeter wave device operating at frequencies in the entire range of or one or more subranges of the frequency range between 1 GHz and 100 THz, wherein the microwave/millimeter wave device comprises a metamaterial arranged on at least one surface thereof, said metamaterial being based on mushroom-shaped or inverted-pyramid-shaped pillars, wherein the metamaterial acts as a perfect magnetic conductor in the operating frequency range.
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12. A scalable production method for fabrication of a microwave/millimeter wave device, said microwave/millimeter wave device operating at frequencies in the entire range of or one or more subranges of the frequency range between 1 GHz and 100 THz, and comprising the step of providing a metamaterial on a surface of said microwave/millimeter wave device, wherein the step of providing said metamaterial on said surface of the microwave/millimeter wave device involves a Lithographie, Galvanoformung, Abformung (Lithography, Electroplating and Molding, LIGA) process.
- 13. A scalable production method for fabrication of a microwave/millimeter wave device, said microwave/millimeter wave device operating at frequencies in the entire range of or one or more subranges of the frequency range between 1 GHz and 100 THz, and comprising the step of providing a metamaterial on a surface of said microwave/millimeter wave device, wherein at least one part of said microwave/millimeter wave device is fabricated using freeforming or 3D forming in metals or other conducting material or metalized non-metals.
Specification