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Electrode plate for plasma etching and plasma etching apparatus

  • US 9,818,583 B2
  • Filed: 07/21/2015
  • Issued: 11/14/2017
  • Est. Priority Date: 09/27/2010
  • Status: Active Grant
First Claim
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1. An electrode plate for a plasma etching formed as a disc shape having a predetermined thickness, the electrode plate comprising:

  • a plurality of gas holes penetrating a surface of the electrode plate perpendicularly to the surface, and provided on different circumferences of a plurality of concentric circles,wherein the electrode plate has two or more regions in a radial direction of the electrode plate, types of gas holes provided in the two or more regions are different from each other by region, and the types of gas holes comprise bent type gas holes,the bent type gas holes are provided in a region including at least the outermost circumference from among the two or more regions, andeach of the bent type gas holes comprises;

    a straight pore penetrating the surface of the electrode plate perpendicularly to the surface;

    a sloping pore communicating with the straight pore in the electrode plate, and penetrating the other surface of the electrode plate non-perpendicularly to the other surface; and

    a trap pore branching from a connecting point between the straight pore and the sloping pore, and forming a path extending the straight pore.

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