Radiation modulator for a lithography apparatus, a lithography apparatus, a method of modulating radiation for use in lithography, and a device manufacturing method

• US 9,823,576 B2
• Filed: 01/27/2014
• Issued: 11/21/2017
• Est. Priority Date: 01/29/2013
• Status: Active Grant

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: ASML Netherlands BV (ASML Holding NV)
• Inventors: Smeets, Dries, Bleeker, Arno Jan, Lee, Christopher James, De Jager, Pieter Willem Herman, Mulder, Heine Melle, Pellens, Rudy Jan Maria
• Primary Examiner(s): Persaud, Deoram
• Application Number:
  US14/165,334
• Publication Number:
  US 20140211189A1
• Time in Patent Office: 1,394 Days
• CPC Class Codes: G03F 7/70191 Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like
• CPC Class Codes: G03F 7/70291 Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices

Abstract

A radiation modulator for a lithography apparatus, a lithography apparatus, a method of modulating radiation for use in lithography, and a device manufacturing method is disclosed. The radiation modulator for a lithography apparatus may have a plurality of waveguides supporting propagation therethough of radiation having a wavelength less than 450 nm; and a modulating section configured to individually modulate radiation propagating in each of the waveguides in order to provide a modulated plurality of output beams.

Claims

1. A radiation modulator for a lithography apparatus, the radiation modulator comprising:

a plurality of waveguides supporting propagation therethough of radiation having a wavelength less than 450 nm, wherein the modulator is configured such that each waveguide of the plurality of waveguides is dedicated to a different radiation source of a plurality of radiation sources;

a modulating section configured to receive radiation from the inputs of the plurality of waveguides and to individually modulate radiation from the respective inputs prior to propagation of the modulated radiation toward outputs of the waveguides in order to provide a modulated plurality of output beams; and

a control system configured to cause at least one of the radiation sources to modulate its radiation output and to control modulation, by the modulating section, of radiation from the inputs of the plurality of waveguides.

2. The modulator according to claim 1, wherein the plurality of waveguides are configured to converge spatially so as to provide a plurality of output beams having an average separation that is smaller than the average separation of the inputs of the waveguides.

3. A lithography apparatus, comprising:

a programmable patterning device configured to provide a plurality of individually controllable radiation beams, the programmable patterning device comprising a radiation modulator, the radiation modulator comprising;

a plurality of waveguides supporting propagation therethough of radiation, wherein the radiation modulator is configured such that each waveguide of the plurality of waveguides is dedicated to a different radiation source of a plurality of radiation sources, and

a modulating section configured to receive radiation from the inputs of the plurality of waveguides and to individually modulate radiation from the respective inputs prior to propagation of the modulated radiation toward outputs of the waveguides in order to provide the plurality of individually controllable radiation beams; and

a projection system configured to project each of the radiation beams onto a respective location on a target.

4. The lithography apparatus according to claim 3, wherein at least two of the inputs are configured to receive radiation from a same radiation source and provide output radiation to separate outputs.

5. The lithography apparatus according to claim 3, wherein a refractive modulator is positioned on an optical path between the input and output of one or more of the waveguides.

6. The lithography apparatus according to claim 5, wherein the refractive modulator is configured to split an input beam into a plurality of beams, refractively modulate the phase of one or more of the plurality of beams in order to change the phase thereof, and recombine the beams to cause interference between the beams.

7. The lithography apparatus according to claim 6, wherein:

the refractive modulator comprises two or more outputs for the recombining beams; and

the phase of one or more of the plurality of beams is modulated to control a distribution of radiation power between the two or more outputs.

8. The lithography apparatus according to claim 7, wherein the refractive modulator comprises two outputs and the control of the distribution of radiation power comprises selectively directing radiation into one of the two outputs and not the other, or selectively directing a proportion of the radiation into one of the two outputs and the rest into the other.

9. The lithography apparatus according to claim 6, wherein two of the beams are modulated so as to change the phase in each beam in opposite senses before recombination.

10. The lithography apparatus according to claim 3, wherein an absorptive modulator is positioned in an optical path between the input and output of one or more of the waveguides for exploiting one or more of the following effects:

Franz-Keldysh effect, quantum-confined Stark effect, excitonic absorption, changes of Fermi level, changes of free carrier concentration, acousto-optic effect, and/or electro-chromic effect.

11. The lithography apparatus according to claim 3, wherein a polarization modulator that is configured to alter the state of polarization of radiation is positioned in an optical path between the input and output of one or more of the waveguides.

12. The lithography apparatus according to claim 11, further comprising a polarization dependent beam splitter configured selectively to re-direct radiation as a function of the polarization of the radiation.

13. The lithography apparatus according to claim 3, wherein the modulating section is configured to modulate the amplitude or intensity of one or more radiation beams output from the waveguides.

14. The lithography apparatus according to claim 3, wherein the modulating section is configured to modulate a polarization of radiation output from one or more of the waveguides.

15. The lithography apparatus according to claim 3, wherein the programmable patterning device further comprises a plurality of self-emissive contrast devices as the plurality of radiation sources, the plurality of self-emissive contrast devices configured to input radiation to the radiation modulator.

16. The lithography apparatus according to claim 3, wherein:

the modulating section is configured to modulate a polarization of radiation output from one or more of the waveguides; and

the apparatus further comprises;

a polarization dependent beam splitter configured to selectively re-direct radiation as a function of the polarization of the radiation; and

a radiation dump configured to receive radiation output by the beam splitter in at least one available output path from the beam splitter.

17. The lithography apparatus according to claim 3, further comprising a radiation distribution device configured to distribute radiation generated by a single radiation source to more than one of the plurality of waveguides of the radiation modulator.

18. The apparatus according to claim 3, wherein the plurality of waveguides are configured to converge spatially so as to provide a plurality of output beams having an average separation that is smaller than the average separation of the inputs of the waveguides.

19. The apparatus according to claim 3, comprising a control system configured to cause at least one of the radiation sources to modulate its radiation output and to control modulation, by the modulating section, of radiation from the inputs of the plurality of waveguides.

20. A method of modulating radiation for use in lithography, the method comprising:

providing a plurality of waveguides for supporting propagation therethrough of radiation having a wavelength less than 450 nm;

causing at least one radiation source of a plurality of radiation sources to modulate its radiation output;

providing radiation to the input of each waveguide from the plurality of radiation sources, wherein each waveguide of the plurality of waveguides is dedicated to a different radiation source of the plurality of radiation sources;

receiving radiation to a modulator from the inputs of the plurality of waveguides; and

individually modulating, by the modulator, radiation from the respective inputs prior to propagation of the modulated radiation toward outputs of the waveguides in order to provide a modulated plurality of output beams.

21. A device manufacturing method, comprising:

providing a plurality of waveguides;

causing at least one radiation source of a plurality of radiation sources to modulate its radiation output;

providing radiation to the input of each waveguide from the plurality of radiation sources, wherein each waveguide of the plurality of waveguides is dedicated to a different radiation source of the plurality of radiation sources;

receiving radiation to a modulator from the inputs of the plurality of waveguides;

individually modulating, by the modulator, radiation from the respective inputs prior to propagation of the modulated radiation toward outputs of the waveguides in order to provide a plurality of individually controllable radiation beams; and

projecting each of the radiation beams onto a respective location on a target.