Microelectromechanical and/or nanoelectromechanical structure with a variable quality factor

• US 9,834,432 B2
• Filed: 04/24/2014
• Issued: 12/05/2017
• Est. Priority Date: 04/25/2013
• Status: Active Grant

• Current Assignee: Commissariat a L'Energie Atomique (AES Corporation)
• Original Assignee: Commissariat a L'Energie Atomique (AES Corporation)
• Inventors: Deimerly, Yannick, Jourdan, Guillaume, Rey, Patrice
• Primary Examiner(s): Caputo, Lisa
• Assistant Examiner(s): Roy, Punam
• Application Number:
  US14/260,539
• Publication Number:
  US 20140318906A1
• Time in Patent Office: 1,321 Days
• CPC Class Codes: B81B 2201/025 Inertial sensors not provided for in B81B2201/0235 - B81B2201/0242
• CPC Class Codes: B81B 7/0016 Protection against shocks or vibrations, e.g. vibration damping
• CPC Class Codes: B81B 7/008 MEMS characterised by an electronic circuit specially adapted for controlling or driving the same B81B7/0087 takes precedence; arrangements for starting, regulating, braking, or otherwise controlling an actuator H02N; control arrangements or circuits for visual indicators G09G3/00
• CPC Class Codes: G01C 19/5726 Signal processing
• CPC Class Codes: G01P 2015/0882 for providing damping of vibrations
• CPC Class Codes: Y10T 29/49082 Resistor making

Abstract

Inertial sensor comprising a fixed part and at least one mass suspended from the fixed part and means of damping the displacement of the part suspended from the fixed part, said damping means being electromechanical damping means comprising at least one DC power supply source, one electrical resistor and one variable capacitor in series, said variable capacitor being formed partly by the suspended part and partly by the fixed part such that displacement of the suspended part causes a variation of the capacitance of the variable capacitor.

Claims

1. A microelectromechanical and/or nanoelectromechanical structure comprising:

at least one fixed part;

at least one suspended part suspended from the fixed part; and

an electromechanical damper that damps the displacement of the suspended part suspended from the fixed part, the electromechanical damper comprising

at least one DC power supply source, and

at least n assemblies comprising an electrical resistor and comprising a variable capacitor or a subassembly of variable capacitors connected in parallel, the variable capacitor or the subassembly being connected in series with the electrical resistor, the electrical resistor being partly formed by the fixed part, the n assemblies being connected in parallel on the DC power supply source, so as to form n loops with a same power supply source or each assembly being connected to a DC power supply source, each variable capacitor being formed partly by the suspended part and partly by the fixed part such that displacement of the suspended part causes a variation of the capacitance of the respective variable capacitor.

2. The structure according to claim 1, wherein the electrical resistors of at least two assemblies are a same.

3. The structure according to claim 1, wherein n is an even number and the structure comprises a fixed part with n electrically independent patterns, the n variable capacitors in the n assemblies being formed by the n patterns in the fixed part, which are arranged on each side of the suspended part relative to a plane of symmetry of the suspended part.

4. The structure according to claim 1, wherein the suspended part forms an inertial mass that comprises a comb with n teeth, and the fixed part comprises a comb with n teeth forming n patterns, the two combs being interdigitised such that one tooth of one comb and one tooth of another comb together form a variable capacitor.

5. The structure according to claim 1, wherein at least one variable capacitor is a variable air gap capacitor.

6. The structure according to claim 1, wherein at least one variable capacitor is a variable area capacitor.

7. The structure according to claim 1, wherein at least one electrode of at least one variable capacitor is formed by at least one test electrode of the structure.

8. The structure according to claim 1, wherein the electromechanical damper is controllable so as to apply a variable damping force.

9. The structure according to claim 1, further comprising an inertial sensor configured to detect displacements of the suspended part.

10. The structure according to claim 9, wherein the inertial sensor is an accelerometer.

11. The structure according to claim 9, further comprising means of exciting at least part of the suspended part.

12. The structure according to claim 11, wherein the electromechanical damper is controllable so as to apply a variable damping force, and in which the inertial sensor is a gyroscope.

13. A device comprising:

at least two inertial sensors integrated onto a single substrate, at least one of the two inertial sensors being an inertial sensor configured to detect displacements of a suspended part in a structure, the structure including at least one fixed part, the suspended part suspended from the fixed part, and an electromechanical damper that damps the displacement of the suspended part suspended from the fixed part, the electromechanical damper comprising at least one DC power supply source, and at least n assemblies comprising an electrical resistor and comprising a variable capacitor or a subassembly of variable capacitors connected in parallel, the variable capacitor or the subassembly being connected in series with the electrical resistor, the electrical resistor being partly formed by the fixed part, the n assemblies being connected in parallel on the DC power supply source, so as to form n loops with a same power supply source or each assembly being connected to a DC power supply source, each variable capacitor being formed partly by the suspended part and partly by the fixed part such that displacement of the suspended part causes a variation of the capacitance of the respective variable capacitor.

14. The device according to claim 13, further comprising a gyroscope and an accelerometer, the gyroscope and the accelerometer being encapsulated in a cavity, the electromechanical damper being such that the accelerometer has a low quality factor.

15. A production process for making a structure or a device, the structure or device including

at least one fixed part,

at least one suspended part suspended from the fixed part, and

an electromechanical damper that damps the displacement of the suspended part suspended from the fixed part, the electromechanical damper comprising

at least one DC power supply source, and

at least n assemblies comprising an electrical resistor and comprising a variable capacitor or a subassembly of variable capacitors connected in parallel, the variable capacitor or the subassembly being connected in series with the electrical resistor, the electrical resistor being partly formed by the fixed part, the n assemblies being connected in parallel on the DC power supply source, so as to form n loops with a same power supply source or each assembly being connected to a DC power supply source. each variable capacitor being formed partly by the suspended part and partly by the fixed part such that displacement of the suspended part causes a variation of the capacitance of the respective variable capacitor, the production process comprising:

making the electrical resistor of the electromechanical damper on or in a substrate that at least partly forms the fixed part;

making the suspended part and the fixed part of the structure; and

releasing at least the suspended part.

16. The production process according to claim 15, wherein the making of the electrical resistor comprises doping so as to control the electrical resistivity of part of a material in which the electrical resistor is made.

17. The production process according to claim 15, further comprising forming a protective layer on the electrical resistor before the making of the suspended part and the fixed part of the structure.