Edge construction on optical devices

• US 9,835,801 B1
• Filed: 09/22/2016
• Issued: 12/05/2017
• Est. Priority Date: 09/22/2016
• Status: Active Grant

• Current Assignee: Mellanox Technologies, Inc. (NVIDIA Corporation)
• Original Assignee: Mellanox Technologies Silicon Photonics Inc. (NVIDIA Corporation)
• Inventors: Qian, Wei, Sharma, Monish
• Primary Examiner(s): Alanko, Anita
• Application Number:
  US15/273,615
• Time in Patent Office: 439 Days
• CPC Class Codes: B81C 2203/054 using structural alignment aids, e.g. spacers, interposers, male/female parts, rods or balls
• CPC Class Codes: B81C 3/005 Passive alignment, i.e. without a detection of the position of the elements or using only structural arrangements or thermodynamic forces
• CPC Class Codes: G02B 2006/12173 Masking
• CPC Class Codes: G02B 2006/12176 Etching
• CPC Class Codes: G02B 6/136 by etching
• CPC Class Codes: G02B 6/24 Coupling light guides
• CPC Class Codes: G02B 6/262 Optical details of coupling light into, or out of, or between fibre ends, e.g. special fibre end shapes or associated optical elements
• CPC Class Codes: G02B 6/30 for use between fibre and thin-film device

Abstract

A method of forming an optical device includes forming a waveguide mask on a device precursor. The device precursor includes a waveguide positioned on a base. The method also includes forming a facet mask on the device precursor such that at least a portion of the waveguide mask is between the facet mask and the base. The method also includes removing a portion of the base while the facet mask protects a facet of the waveguide.

Claims

1. A method of forming an optical device, comprising:

forming a waveguide mask on a device precursor,

the device precursor including a waveguide positioned on a base;

forming a facet mask on the device precursor such that at least a portion of the waveguide mask is between the facet mask and the base; and

forming a recess in the base while a protective portion of the facet mask is over a facet of the waveguide, the protective portion of the facet mask also being over a facet shelf that extends from a side of the recess.

2. The method of claim 1, further comprising:

placing an optical fiber in the recess such that a facet of the optical fiber is aligned with the facet of the waveguide.

3. The method of claim 1, further comprising:

removing a portion of the device precursor after forming the waveguide mask and before forming the facet mask, the portion of the device precursor being removed so as to define the facet on the device precursor.

4. The method of claim 1, wherein the side of the recess is less than 0.5 μ

m from the facet.

5. The method of claim 1, further comprising:

removing a first portion of the facet mask from over the waveguide after forming the facet mask and before forming the recess.

6. The method of claim 5, wherein a thickness of the protective portion of the facet mask over the facet is less than 0.5 μ

m, where the thickness is measured in a direction perpendicular to the facet.

7. The method of claim 6, wherein the thickness of the protective portion of the facet mask varies across the facet and a maximum of the thickness is less than 0.5 μ

m.

8. The method of claim 5, further comprising:

removing the protective portion of the facet mask.

9. The method of claim 1, wherein the facet mask is not a photoresist.

10. The method of claim 9, wherein the waveguide mask is a photoresist.

11. The method of claim 1, wherein the waveguide and the facet shelf are located on opposing sides of the facet.

12. The method of claim 1, wherein the facet shelf has a width less than 0.5 μ

m.

13. The method of claim 1, wherein after forming the recess, the facet is flush with a portion of the base.

14. The method of claim 1, wherein after forming the recess a second portion of the base that remains on the device precursor undercuts the waveguide.

15. The method of claim 1, further comprising:

removing from the device precursor the protective portion of the facet mask.

16. The method of claim 15, wherein the waveguide and the facet shelf are located on opposing sides of the facet, and

the protective portion of the facet mask is removed such that a thickness of the facet shelf is reduced,

the thickness of the facet shelf being measured in a direction that is perpendicular to a plane that includes the facet.

17. A method of forming an optical device, comprising:

forming a waveguide mask on a device precursor,

the device precursor including a waveguide positioned on a base;

forming a facet mask on the device precursor such that at least a portion of the waveguide mask is between the facet mask and the base; and

removing a portion of the base while the facet mask protects a facet of the waveguide, the portion of the base being removed such that after removing the portion of the base the facet is above a facet shelf that extends outward from a plane that includes the facet with the waveguide and the facet shelf being on opposing sides of the facet, the facet shelf having a width less than 0.5 μ

m.

18. The method of claim 17, wherein removing the portion of the base forms a recess in the base and further comprising:

placing an optical fiber in the recess such that a facet of the optical fiber is aligned with the facet of the waveguide.

19. The method of claim 17, wherein removing the portion of the base forms a recess in the base and a side of the recess is less than 0.5 μ

m from a plane that includes the facet.

20. The method of claim 17, further comprising:

removing a first portion of the facet mask from over the waveguide after forming the facet mask and before removing the portion of the base.

21. A method of forming an optical device, comprising:

forming a waveguide mask on a device precursor,

the device precursor including a waveguide positioned on a base;

forming a facet mask on the device precursor such that at least a portion of the waveguide mask is between the facet mask and the base;

removing a portion of the base while the facet mask protects a facet of the waveguide, the portion of the base being removed such that after removing the portion of the base the facet is above a facet shelf that extends outward from a plane that includes the facet with the waveguide and the facet shelf being on opposing sides of the facet; and

removing from the device precursor a protective portion of the facet mask, the protective portion of the facet mask being a portion of the facet mask that remains on the device precursor after the portion of the base is removed, the protective portion of the facet mask being removed such that a thickness of the facet shelf is reduced, the thickness of the facet shelf being measured in a direction that is perpendicular to a plane that includes the facet.

22. The method of claim 21, wherein removing the portion of the base forms a recess in the base and further comprising:

placing an optical fiber in the recess such that a facet of the optical fiber is aligned with the facet of the waveguide.

23. The method of claim 21, wherein removing the portion of the base forms a recess in the base and a side of the recess is less than 0.5 μ

m from a plane that includes the facet.

24. The method of claim 21, further comprising:

removing a first portion of the facet mask from over the waveguide after forming the facet mask and before removing the portion of the base.

25. A method of forming an optical device, comprising:

forming a waveguide mask on a device precursor,

the device precursor including a waveguide positioned on a base;

forming a facet mask on the device precursor such that at least a portion of the waveguide mask is between the facet mask and the base; and

removing a portion of the base while the facet mask protects a facet of the waveguide, the portion of the base being removed such that after removing the portion of the base a second portion of the base that remains on the device precursor undercuts the waveguide.

26. The method of claim 25, wherein removing the portion of the base forms a recess in the base and further comprising:

placing an optical fiber in the recess such that a facet of the optical fiber is aligned with the facet of the waveguide.

27. The method of claim 25, wherein removing the portion of the base forms a recess in the base and a side of the recess is less than 0.5 μ

m from a plane that includes the facet.

28. The method of claim 25, further comprising:

removing a first portion of the facet mask from over the waveguide after forming the facet mask and before removing the portion of the base.