×

Fine pitch BVA using reconstituted wafer with area array accessible for testing

  • US 9,837,330 B2
  • Filed: 02/02/2017
  • Issued: 12/05/2017
  • Est. Priority Date: 01/17/2014
  • Status: Active Grant
First Claim
Patent Images

1. A method for making a microelectronic unit, comprising the steps of:

  • providing an electrically conductive redistribution structure on a carrier and providing a microelectronic element attachment region of the redistribution structure;

    forming a plurality of electrically conductive connector elements adjacent opposite ends of the attachment region, each connector element having a first end, a second, end and edge surfaces extending vertically between the first and second ends, the first end of each connector element being adjacent the redistribution structure and the second end of each connector element at a height greater than 50 microns above the carrier; and

    forming a dielectric encapsulation between adjacent edge surfaces of the connector elements,wherein the microelectronic unit includes a microelectronic element coupled to the attachment region, the microelectronic element having a first face which faces away from the redistribution structure, the microelectronic element having element contacts at the first face that are configured for joining with corresponding component contacts of a component external to the microelectronic unit through electrically conductive masses in a state in which the element contacts are juxtaposed with the corresponding component contacts.

View all claims
  • 3 Assignments
Timeline View
Assignment View
    ×
    ×