Lithographic apparatus and device manufacturing method utilizing data filtering

• US 9,846,368 B2
• Filed: 07/12/2013
• Issued: 12/19/2017
• Est. Priority Date: 03/30/2005
• Status: Active Grant

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: ASML Netherlands BV (ASML Holding NV)
• Inventors: Tinnemans, Patricius Aloysius Jacobus, Baselmans, Johannes Jacobus Matheus
• Primary Examiner(s): NGUYEN, HUNG
• Application Number:
  US13/940,796
• Publication Number:
  US 20130301025A1
• Time in Patent Office: 1,621 Days
• Field of Search: 355 53, 355 67- 71
• CPC Class Codes: G03F 7/70191 Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like
• CPC Class Codes: G03F 7/70291 Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
• CPC Class Codes: G03F 7/70433 Layout for increasing efficiency or for compensating imaging errors, e.g. layout of exposure fields for reducing focus errors; Use of mask features for increasing efficiency or for compensating imaging errors
• CPC Class Codes: G03F 7/70508 Data handling in all parts of the microlithographic apparatus, e.g. handling pattern data for addressable masks or data transfer to or from different components within the exposure apparatus

Abstract

An apparatus and method are used to form patterns on a substrate. The apparatus comprises a projection system, a patterning device, a low-pass filter, and a data manipulation device. The projection system projects a beam of radiation onto the substrate as an array of sub-beams. The patterning device modulates the sub-beams to substantially produce a requested dose pattern on the substrate. The low-pass filter operates on pattern data derived from the requested dose pattern in order to form a frequency-clipped target dose pattern that comprises only spatial frequency components below a selected threshold frequency. The data manipulation device produces a control signal comprising spot exposure intensities to be produced by the patterning device, based on a direct algebraic least-squares fit of the spot exposure intensities to the frequency-clipped target dose pattern. In various examples, filters can also be used.

Claims

1. A lithography apparatus, comprising:

a patterning device comprising an array of individually controllable elements, the patterning device configured to modulate a beam of radiation;

a projection system configured to project the modulated beam of radiation onto a substrate; and

a critical dimension (CD)-biasing filter configured to operate on pattern data and control critical dimension characteristics of a radiation dose pattern produced by the patterning device;

wherein the CD-biasing filter is configured to adjust a critical dimension of multiple regions of the radiation dose pattern independently.

2. A lithography apparatus, comprising:

a patterning device comprising an array of individually controllable elements, the patterning device configured to modulate a beam of radiation;

a projection system configured to project the modulated beam of radiation onto a substrate; and

a critical dimension (CD)-biasing filter configured to operate on pattern data and control critical dimension characteristics of a radiation dose pattern produced by the patterning device;

a rasterizer positioned after the CD-biasing filter and configured to rasterize the pattern data to a sequence of data representing a requested dose pattern at a corresponding sequence of points within the pattern;

wherein a controller is further configured to receive the rasterized data and produce a control signal comprising spot exposure intensities for production by the patterning device.

3. A method, comprising:

modulating, based on pattern data, a beam of radiation using an array of individually controllable elements;

projecting the modulated beam of radiation onto a substrate; and

CD-bias filtering the pattern data to control critical dimension characteristics of a radiation dose pattern produced by the modulating;

adjusting a critical dimension of multiple regions of the radiation dose pattern independently.

4. A system comprising:

a projection system configured to project a beam of radiation onto a substrate as an array of sub-beams of radiation;

a modulator configured to modulate the sub-beams of radiation to substantially form a requested dose pattern on the substrate, the requested dose pattern being built up over time from an array of spot exposures, each of the spot exposures being produced by one of the sub-beams of radiation at a given time;

a rasterizer configured to convert data defining the requested dose pattern to a sequence of data representing the requested dose at a corresponding sequence of points within the pattern;

a controller configured to receive the sequence of data and generate a control signal therefrom, the control signal being used to control the modulator; and

a critical dimension (CD)-biasing filter configured to change the control signal to control critical dimension characteristics of the requested dose pattern produced by the modulator.

5. The system of claim 4, wherein the CD-biasing filter is configured to change the control signal to adjust a critical dimension of the requested dose pattern parallel to a first axis independently from a critical dimension parallel to a second axis, the second axis being non-parallel to the first axis.

6. The system of claim 4, wherein the CD-biasing filter is configured to change the control signal to adjust a critical dimension of multiple regions of the requested dose pattern independently.

7. The system of claim 4, wherein the CD-biasing filter is positioned before the rasterizer and configured to change the control signal off-line.

8. The system of claim 4, further comprising:

a radiation source;

wherein the CD-biasing filter is further configured to change the control signal in-line and vary the intensity of the radiation source.

9. The system of claim 4, wherein the modulator comprises an array of individually controllable elements configured to provide the array of sub-beams of radiation.

10. The system of claim 4, wherein the modulator comprises an array of individually controllable elements configured to pattern the array of sub-beams of radiation.