Method for hermetically sealing with reduced stress

• US 9,850,122 B2
• Filed: 07/09/2014
• Issued: 12/26/2017
• Est. Priority Date: 07/10/2013
• Status: Active Grant

• Current Assignee: Melexis Technologies NV (Sensinnovat BVBA)
• Original Assignee: Melexis Technologies NV (Sensinnovat BVBA)
• Inventors: Van Der Wiel, Appolonius Jacobus
• Primary Examiner(s): Lee, Eugene
• Application Number:
  US14/903,709
• Publication Number:
  US 20160159639A1
• Time in Patent Office: 1,266 Days
• CPC Class Codes: B81B 7/0038 using materials for controlling the level of pressure, contaminants or moisture inside of the package, e.g. getters
• CPC Class Codes: B81B 7/0051 between the package lid and the substrate
• CPC Class Codes: B81C 1/00285 using materials for controlling the level of pressure, contaminants or moisture inside of the package, e.g. getters
• CPC Class Codes: B81C 2203/0145 Hermetically sealing an opening in the lid
• CPC Class Codes: H01L 2924/16235 Connecting to a semiconductor or solid-state bodies, i.e. cap-to-chip

Abstract

An electronic device comprising a first substrate having a device area, a first sealing element comprising an anelastic material and a second sealing element being a metal. The first sealing means and the second sealing means are arranged such that the inner side or the outer side of the sealing is completely formed by the second sealing element providing hermiticity and the other side is substantially formed by the first sealing element providing a flexible sealing.

Claims

1. An electronic device comprising:

a first substrate having a device area,

a first sealing means for sealing the device area, the first sealing means having an inner side facing the device area and an outer side facing away from the device area, the first sealing means comprising

a first sealing element being positioned on the first substrate, the first sealing element forming a closed loop surrounding the device area and comprising an anelastic material,

a second sealing element being a metal, the second sealing element being in contact with the first sealing element along the closed loop,

a second substrate positioned on the first sealing means so as to sandwich the first sealing means between the first and the second substrate for hermetically sealing the device area,

wherein the first sealing element and the second sealing element are arranged such that one upright wall of the first sealing element is covered by the second sealing element such that the inner side or the outer side of the first sealing means is completely formed by the second sealing element and the other side is substantially formed by the first sealing element.

2. An electronic device according to claim 1, wherein the second sealing element is a metal film being partly deposited over the first sealing element.

3. An electronic device according to claim 1, wherein the inner side facing the device area is formed by the second sealing element being a metal, and the outer side facing away from the device area is formed by the first sealing element comprising an anelastic material.

4. An electronic device according to claim 2, wherein the metal layer has a smooth cross-sectional profile without sharp edges.

5. An electronic device according to claim 4, wherein the metal layer comprises a first, a middle and a third portion, the portions being interconnected and the first portion being adhering to the first substrate, the middle portion being inclined with respect to the first substrate for allowing flexibility during temperature changes and the third portion being an upper portion substantially parallel with the substrate to facilitate further connection thereon.

6. An electronic device according to claim 5, wherein the first portion of the metal layer is positioned underneath the anelastic material, the middle portion is positioned aside the anelastic material and the third portion is positioned on top of the anelastic material.

7. An electronic device according to claim 5, wherein the middle portion of the metal layer has a sloped edge forming an angle (α

) with respect to the first substrate in the range of 20°

to 70°

.

8. An electronic device according to claim 1, wherein the anelastic material is selected from the group consisting of polyimides, silicones, acrylates, epoxys and fluoroelastomers.

9. An electronic device according to claim 1, wherein the metal of metal layer is selected from the group of copper, tin, gold, aluminium and germanium.

10. An electronic device according to claim 1, the electronic device further comprising a second sealing means having an inner side facing the outer side of the first sealing means and the second sealing means having an outer side facing away from the first sealing means, the second sealing means comprising

a third sealing element positioned on the first substrate and comprising an anelastic material,

a fourth sealing element being in contact with the third sealing and being a metal, wherein the third sealing element and the fourth sealing element are arranged such that the inner side or the outer side of the second sealing means is completely formed by the fourth sealing element and the other side is substantially formed by the third sealing element.

11. An electronic device according to claim 10, wherein the first sealing means comprises the second sealing element at the inner side and wherein the second sealing means comprises the fourth sealing element at the outer side.

12. An electronic device according to claim 1, wherein the device area comprises an infra-red sensor device, and wherein the second substrate is transparent for IR radiation.

13. An electronic device according to claim 1, wherein the device area comprises a MEMS device.

14. A method for hermetically sealing a device area of a first substrate, the method comprising the steps of:

a) providing a first substrate having a device area to be hermetically sealed;

b) providing a first sealing means for sealing the device area, the first sealing means having an inner side facing the device area and an outer side facing away from the device area, the first sealing means comprising a first sealing element being positioned on the first substrate, the first sealing element forming a closed loop surrounding the device area and comprising an anelastic material and a second sealing element being a metal, the second sealing element being in contact with the first sealing element along the closed loop, and the first sealing element and the second sealing element being arranged such that one upright wall of the first sealing element is covered by the second sealing element such that the inner side or the outer side of the first sealing means is completely formed by the second sealing element and the other side is substantially formed by the first sealing element;

c) providing a solder metal on top of the second sealing element;

d) aligning a second substrate on top of the solder metal for hermetically sealing the area.

15. A method according to claim 14, wherein the anelastic material is selected from the group consisting of polyimides, silicones, acrylates, epoxies and fluoroelastomers.

16. A method according to claim 14, wherein the metal is selected from the group of copper, aluminum, gold, tin and germanium.

17. A method according to claim 14, wherein providing a first sealing means comprises providing a metal layer by providing a seed layer by vacuum deposition, and by electroplating the metal layer or by providing a metal layer by sputtering.

18. A method according to claim 14, wherein the method furthermore comprises providing a second sealing means comprising a third sealing element positioned on the first substrate and comprising an anelastic material, and comprising a fourth sealing element being in contact with the third sealing and being a metal, wherein the third sealing element and the fourth sealing element are arranged such that the inner side or the outer side of the second sealing means is completely formed by the fourth sealing element and the other side is substantially formed by the third sealing element.

19. An electronic device comprising:

a first substrate having a device area,

a first sealing means for sealing the device area, the first sealing means having an inner side facing the device area and an outer side facing away from the device area, the first sealing means comprising

a first sealing element being positioned on the first substrate, the first sealing element forming a closed loop surrounding the device area and comprising an anelastic material,

a second sealing element being a metal, the second sealing element being in contact with the first sealing element along the closed loop,

a second substrate positioned on the first sealing means so as to sandwich the first sealing means between the first and the second substrate for hermetically sealing the device area with a eutectic bond between the each wafer and the second sealing element,

wherein the first sealing element and the second sealing element are arranged such that one upright wall of the first sealing element is covered by the second sealing element such that the inner side or the outer side of the first sealing means is completely formed by the second sealing element and the other side is substantially formed by the first sealing element, and

wherein the second sealing element has a smooth Z-shaped cross-sectional profile having a thickness between 0.1 and 100 μ

m.