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Lithographic apparatus and device manufacturing method

  • US 9,851,644 B2
  • Filed: 08/15/2016
  • Issued: 12/26/2017
  • Est. Priority Date: 12/30/2005
  • Status: Active Grant
First Claim
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1. A method comprising:

  • supporting a substrate on a substrate table;

    providing a liquid in a region between a projection system and the substrate;

    projecting, using the projection system, a modulated radiation beam through the liquid and onto a substrate; and

    removably supporting a single cover plate having an opening wider than the substrate on the substrate table, during the projecting, using a two-dimensional array of protrusions, the cover plate providing a surface facing the projection system that is adjacent the substrate.

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