Integrated circuit device including vertical memory device and method of manufacturing the same
First Claim
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1. An integrated circuit (IC) device comprising:
- a plurality of word lines that extend on a substrate parallel to a main surface of the substrate and are separated from one another in a first direction perpendicular to the main surface;
a channel region that extends in a first region on the substrate through the plurality of word lines;
a bit line contact pad that is on the channel region and contacts an upper surface of the channel region;
a bit line that contacts the bit line contact pad in the first region and extends on the bit line contact pad in a second direction parallel to the main surface of the substrate;
a common source line that partially fills a word line cut region in the first region and a second region separated from the first region, with a word line cut region buried insulating layer interposed between the common source line and the bit line in the first region, the word line cut region extending in a third direction on a side of the plurality of word lines, the third direction being parallel to the main surface of the substrate and intersecting the second direction, the common source line having a height from the substrate lower than that of the channel region; and
a common source via contact that contacts an upper surface of the common source line in the word line cut region in the second region and extends from the upper surface of the common source line in a direction away from the substrate.
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Abstract
An integrated circuit (IC) device includes: a channel region that extends on the substrate to penetrate a plurality of word lines; a bit line contact pad that contacts an upper surface of the channel region; a bit line that contacts the bit line contact pad and extends on the bit line contact pad in a direction parallel to the main surface of the substrate; a common source line that partially fills a word line cut region and has a height lower than that of the channel region; and a common source via contact that contacts an upper surface of the common source line in the word line cut region.
36 Citations
15 Claims
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1. An integrated circuit (IC) device comprising:
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a plurality of word lines that extend on a substrate parallel to a main surface of the substrate and are separated from one another in a first direction perpendicular to the main surface; a channel region that extends in a first region on the substrate through the plurality of word lines; a bit line contact pad that is on the channel region and contacts an upper surface of the channel region; a bit line that contacts the bit line contact pad in the first region and extends on the bit line contact pad in a second direction parallel to the main surface of the substrate; a common source line that partially fills a word line cut region in the first region and a second region separated from the first region, with a word line cut region buried insulating layer interposed between the common source line and the bit line in the first region, the word line cut region extending in a third direction on a side of the plurality of word lines, the third direction being parallel to the main surface of the substrate and intersecting the second direction, the common source line having a height from the substrate lower than that of the channel region; and a common source via contact that contacts an upper surface of the common source line in the word line cut region in the second region and extends from the upper surface of the common source line in a direction away from the substrate. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15)
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Specification