Distributed feedback semiconductor laser element

• US 9,859,683 B2
• Filed: 01/04/2017
• Issued: 01/02/2018
• Est. Priority Date: 01/08/2016
• Status: Active Grant

• Current Assignee: Hamamatsu Photonics KK
• Original Assignee: Hamamatsu Photonics KK
• Inventors: Hitaka, Masahiro, Takagi, Yutaka, Sugiyama, Takahiro
• Primary Examiner(s): Park, Kinam
• Application Number:
  US15/397,868
• Publication Number:
  US 20170201069A1
• Time in Patent Office: 363 Days
• CPC Class Codes: H01S 5/06804 by monitoring an external parameter, e.g. temperature
• CPC Class Codes: H01S 5/12 the resonator having a periodic structure, e.g. in distributed feedback [DFB] lasers comprising a photonic bandgap structure H01S5/11; surface-emitting lasers H01S5/18
• CPC Class Codes: H01S 5/2009 by using electron barrier layers
• CPC Class Codes: H01S 5/22 having a ridge or stripe structure
• CPC Class Codes: H01S 5/34 comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers H01S5/36 takes precedence
• CPC Class Codes: H01S 5/3407 characterised by special barrier layers
• CPC Class Codes: H01S 5/3408 characterised by specially shaped wells, e.g. triangular
• CPC Class Codes: H01S 5/34313 with a well layer having only As as V-compound, e.g. AlGaAs, InGaAs
• CPC Class Codes: H01S 5/34353 based on (AI)GaAs

Abstract

A DFB laser element includes an active layer 4 having a multiple quantum well structure including a plurality of well layers 4B having different thicknesses, a diffraction grating layer 6 that is optically coupled to the active layer 4, and a pair of cladding layers with the active layer 4 and the diffraction grating layer 6 interposed therebetween. An effective refractive index of the diffraction grating layer 6 is high, and a thickness of the well layer 4B increases as a distance from the diffraction grating layer 6 increases. In this structure, it is possible to reduce dependence on temperature when the DFB semiconductor laser element is miniaturized.

Claims

1. A distributed feedback semiconductor laser element, comprising:

an active layer having a multiple quantum well structure including a plurality of well layers having different thicknesses;

a diffraction grating layer that is optically coupled to the active layer; and

a pair of cladding layers with the active layer and the diffraction grating layer interposed therebetween,

wherein when a region that is interposed between the cladding layers is defined as a core layer,

the diffraction grating layer includes a layer having a refractive index higher than an average refractive index of the core layer, and

a thickness of the well layer increases as a distance from the diffraction grating layer increases.

2. The distributed feedback semiconductor laser element according to claim 1, comprising:

one or more layers having a higher refractive index than a mode equivalent refractive index with respect to light propagating through the core layer between the diffraction grating layer and the well layers.

3. The distributed feedback semiconductor laser element according to claim 1,

wherein the number of well layers is two or more.

4. The distributed feedback semiconductor laser element according to claim 1,

wherein when N is a natural number, a thickness of an N-th well layer from the diffraction grating layer among the plurality of well layers is d(N), and the optical confinement factor of the N-th well layer is Γ

(N), a relative change in F(N) is 10% or less.

5. The distributed feedback semiconductor laser element according to claim 1,

wherein when the diffraction grating layer is one-dimensional, a coupling coefficient κ

of the diffraction grating layer satisfies the following relationship expression;

20 cm<sup>−

1</sup>≦

κ

≦

1000 cm<sup>−

1</sup>.

6. The distributed feedback semiconductor laser element according to claim 1,

wherein the diffraction grating layer is a two-dimensional diffraction grating layer.

7. The distributed feedback semiconductor laser element according to claim 6,

wherein the diffraction grating layer comprises:

a base layer; and

a plurality of different-refractive-index regions having a refractive index different from that of the base layer,

wherein the different-refractive-index region is arranged at a grating point position on a square grating including horizontal lines connecting angular positions of 0° and

180° and

vertical lines connecting angular positions of 90° and

270°

in a plan view as viewed in a direction perpendicular to the base layer, the diffraction grating layer constitutes a two-dimensional square grating diffraction grating layer, and

a coupling coefficient κ

1 in a 90°

direction and a coupling coefficient κ

3 in a 180°

direction satisfy the following relationship expression;

100 cm<sup>−

1</sup>≦

κ

1≦

5000 cm<sup>−

1</sup>, and

50 cm<sup>−

1</sup>≦

κ

3≦

5000 cm<sup>−

1</sup>.

8. The distributed feedback semiconductor laser element according to claim 7,

wherein the active layer includes a barrier layer between the well layers,

band gap energy of the barrier layer is set to be lower than band gap energy of the cladding layer, and

band gap energy of the well layer is set to be lower than the band gap energy of the barrier layer.

9. The distributed feedback semiconductor laser element according to claim 1, comprising:

between the active layer and the diffraction grating layer, a carrier barrier layer that suppresses movement of carriers between the active layer and the diffraction grating layer.

10. A distributed feedback semiconductor laser element, comprising:

an active layer having a multiple quantum well structure including a plurality of well layers having different materials;

a diffraction grating layer that is optically coupled to the active layer; and

a pair of cladding layers with the active layer and the diffraction grating layer interposed therebetween,

wherein when a region that is interposed between the cladding layers is defined as a core layer,

the diffraction grating layer includes a layer having a refractive index higher than an average refractive index of the core layer, and

a band gap energy that is defined by a material of the well layers decreases as a distance from the diffraction grating layer increases.