Three dimensional nanometer filters and methods of use

• US 9,861,920 B1
• Filed: 05/01/2015
• Issued: 01/09/2018
• Est. Priority Date: 05/01/2015
• Status: Active Grant

• Current Assignee: Imagine TF, LLC
• Original Assignee: Imagine TF, LLC
• Inventors: Richardson, Brian Edward
• Primary Examiner(s): Clemente, Robert
• Application Number:
  US14/701,528
• Time in Patent Office: 984 Days
• Field of Search: 55523
• CPC Class Codes: B01D 2239/0258 comprising nanoparticles
• CPC Class Codes: B01D 2239/065 More than one layer present in the filtering material apparatus incorporating such gas filtering material B01D2275/10
• CPC Class Codes: B01D 29/0093 Making filtering elements not provided for elsewhere
• CPC Class Codes: B01D 39/20 of inorganic material, e.g. asbestos paper, metallic filtering material of non-woven wires porous ceramic material C04B38/00 ; sintering metals C22C1/04; making porous sintered metal bodies B22F3/10, honeycomb filters B01D46/2418, materials used for filtering exhaust gases of an internal combustion engine F01N3/022, ceramic honeycomb structures C04B38/0006
• CPC Class Codes: B01D 39/2068 Other inorganic materials, e.g. ceramics
• CPC Class Codes: B01D 39/2075 sintered or bonded by inorganic agents
• CPC Class Codes: B01D 46/0001 Making filtering elements

Abstract

Three dimensional nanoparticle filters are provided herein. In one embodiment a filter device includes a base material, alternating layers of sacrificial material between layers of structural material being deposited onto the base material to create a layered base material, and filter sidewalls etched into the deposited alternating layers of the layered base material to remove the layers of sacrificial material between the layers of structural material to form filter slots in the filter sidewalls as well as create channels between the filter sidewalls, where a size of the filter slots is selectable based on a thickness of the layers of sacrificial material utilized.

Claims

1. A filter substrate, comprising:

a base material;

deposited alternating layers of sacrificial material between layers of structural material disposed onto the base material creating a layered base material; and

filter sidewalls etched into the deposited alternating layers of the layered base material, where at least a portion of the layers of sacrificial material between the layers of structural material have been removed to form filter slots in the filter sidewalls, and channels extend between the filter sidewalls, wherein a size of the filter slots is selectable based on a thickness of the layers of sacrificial material utilized.

2. The filter substrate according to claim 1, further comprising a layer of covering layer applied to one or more of the layers of the structural material to enhance filtering.

3. The filter substrate according to claim 2, wherein the covering layer is selected from any of silicone dioxide, titanium dioxide, copper, carbon, and any combinations thereof.

4. The filter substrate according to claim 1, further comprising posts that are deposited on the base material and wherein the filter sidewalls are defined by the posts.

5. The filter substrate according to claim 4, wherein the posts comprise cylindrical segments along the filter sidewalls.

6. The filter substrate according to claim 5, wherein at least a portion of the sides of the cylindrical segments are removed.

7. The filter substrate according to claim 6, wherein a top surface of the filter substrate is planarized.

8. The filter substrate according to claim 1, further comprising a plurality of filter substrates together to form a filter device.

9. The filter substrate according to claim 8, further comprising one or more input and output apertures formed on the filter device, wherein the one or more input and output apertures extend from a top surface of the filter device to a bottom surface of the filter device.

10. The filter substrate according to claim 8, further comprising:

a plurality of substantially v-shaped filter sidewalls assembled into cross channels;

a central aperture inlet that extends from a top surface of the filter device to a bottom surface of the filter device; and

a plurality of inlet/outlet channels between the cross channels.

11. The filter substrate according to claim 1, wherein the base material comprises a material selected from any of silicon, quartz, borosilicate glass, silicone dioxide, glass, silicon nitride, silicon carbon, aluminum, titanium, chromium, molybdenum, tungsten, copper, gold, a photoresist, a polymer, or any combination thereof.

12. The filter substrate according to claim 1, wherein the base material comprises a material selected from any of PET, polycarbonate, or a metal.

13. The filter substrate according to claim 1, wherein the filter sidewalls are etched using any of wet etching, dry etching, laser etching, sintering, cutting via stamping, or any combination thereof.

14. A filter substrate, comprising:

a base material; and

a continuous filter sidewall disposed on the base material, the continuous filter sidewall comprising layers of porous material and layers of sacrificial material and spaces and including an input and an output and outlet sections, the continuous filter sidewall being fabricated so as to comprise filtering elements, wherein fluid entering inlet sections passes through the continuous filter sidewall to remove particulates by the filtering elements and a filtered fluid exits the outlet sections.

15. The filter substrate according to claim 14, wherein when the layers of sacrificial material are removed the spacers remain and extend between the layers of porous material.