×

Wafer alignment mark scheme

  • US 9,863,754 B2
  • Filed: 09/15/2014
  • Issued: 01/09/2018
  • Est. Priority Date: 03/28/2012
  • Status: Active Grant
First Claim
Patent Images

1. A wafer alignment apparatus, comprising:

  • a light source;

    a light detection device; and

    a rotation device rotates a wafer, the wafer including more than two wafer alignment marks in a surface of the wafer, each of the more than two wafer alignment marks including an identifiably different number of recesses in the surface of the wafer,wherein the light source provides light directed to the wafer, the light detection device detects identifiably different reflected light intensities from the identifiably different number of recess in the surface of the wafer to locate at least one wafer alignment mark of the more than two wafer alignment marks separated by a plurality of angles, and at least two of the angles are equal.

View all claims
  • 1 Assignment
Timeline View
Assignment View
    ×
    ×