Graphene-based multi-modal sensors

• US 9,863,885 B2
• Filed: 10/07/2016
• Issued: 01/09/2018
• Est. Priority Date: 10/07/2015
• Status: Active Grant

• Current Assignee: Regents of the University of California (University of California)
• Original Assignee: Regents of the University of California (University of California)
• Inventors: Zaretski, Aliaksandr, Lipomi, Darren J., Savtchenko, Alex, Molokanova, Elena, Mercola, Mark
• Primary Examiner(s): Chowdhury, Tarifur
• Assistant Examiner(s): Amara, Mohamed K
• Application Number:
  US15/288,687
• Publication Number:
  US 20170102334A1
• Time in Patent Office: 459 Days
• CPC Class Codes: C23C 14/024 Deposition of sublayers, e.g. to promote adhesion of the coating C23C14/027 takes precedence
• CPC Class Codes: C23C 14/04 Coating on selected surface areas, e.g. using masks
• CPC Class Codes: C23C 14/18 on other inorganic substrates
• CPC Class Codes: C23C 14/30 by electron bombardment
• CPC Class Codes: C23C 16/01 on temporary substrates, e.g. substrates subsequently removed by etching
• CPC Class Codes: C23C 16/0227 by cleaning or etching
• CPC Class Codes: C23C 16/26 Deposition of carbon only
• CPC Class Codes: G01L 1/18 using properties of piezo-resistive materials, i.e. materials of which the ohmic resistance varies according to changes in magnitude or direction of force applied to the material
• CPC Class Codes: G01N 2021/651 Cuvettes therefore
• CPC Class Codes: G01N 21/658 enhancement Raman, e.g. surface plasmons
• CPC Class Codes: G01N 27/028 Circuits therefor measuring impedance per se G01R27/02

Abstract

A method for fabricating a composite film structure, the method includes determining a desired morphology for a metallic layer of the composite film structure, selecting a first metal substrate based on the determining, transferring a graphene layer onto the first metal substrate, depositing the metallic layer on the graphene layer to achieve the desired morphology, and removing the first metal substrate from the graphene and the deposited metallic layer to form the composite film structure. A surface energy difference between the first metal substrate and the deposited metallic layer results in the desired morphology of the metallic layer.

Claims

1. A method for fabricating a composite film structure, the method comprising:

determining a desired morphology for a metallic layer of the composite film structure;

selecting a first metal substrate based on the determining;

transferring a graphene layer onto the first metal substrate;

depositing the metallic layer on the graphene layer to achieve the desired morphology, wherein a surface energy difference between the first metal substrate and the deposited metallic layer results in the desired morphology of the metallic layer, the desired morphology comprises a layer of nanoislands having controlled and uniform inter-nanoisland separation and a distance between edges of nanoislands in the metallic layer is on the order of about 2 Å

to a few nanometers, and removing the first metal substrate from the graphene and the deposited metallic layer to form the composite film structure.

2. The method of claim 1, wherein depositing the metallic layer comprises deposition of evaporated flux of metallic atoms.

3. The method of claim 2, wherein the evaporated flux of metallic atoms self-assemble to yield the desired morphology.

4. The method of claim 2, where in the evaporated flux of metallic atoms are produced by electron beam evaporation, thermal evaporation, or sputtering.

5. The method of claim 1, wherein transferring the graphene layer onto the first metal substrate comprises exfoliating the graphene grown on a second metal substrate and placing the graphene layer onto the first metal substrate;

and wherein the graphene comprises a single layer of graphene.

6. The method of claim 5, wherein the graphene is grown on the second metal substrate using chemical vapor deposition.

7. The method of claim 1, wherein the first metal substrate comprises a transition metal.

8. The method of claim 7, wherein the transition metal comprises gold, silver, or nickel.

9. A method of forming a substrate for surface-enhanced Raman scattering, the method comprising:

depositing a graphene layer on a first metal substrate;

depositing a plurality of metallic nanoislands on the graphene layer, wherein a surface energy difference between the first metal substrate and the deposited metallic nanoislands results in the desired morphology of the metallic nanoislands, the desired morphology comprises a layer of nanoislands having controlled and uniform inter-nanoisland separation and a distance between edges of nanoislands in the metallic layer is on the order of about 2 Å

to a few nanometers;

removing the first metal substrate from the graphene and the deposited plurality of metallic nanoislands to form the substrate for surface-enhanced Raman scattering.

10. A method of performing surface-enhanced Raman scattering of an analyte, the method comprising:

forming a substrate for surface-enhanced Raman scattering according to the method of claim 9;

transferring the substrate on an optical fiber;

coating the analyte on the substrate; and

recording surface-enhanced Raman scattering signals from the analyte.

11. The method of claim 10, wherein the plurality of metallic nanoislands comprises a plasmonically active metal.

12. The method of claim 11, wherein the plasmatically active metal comprises copper, silver, palladium, gold, or platinum nanoislands.

13. A method of performing surface-enhanced Raman scattering of an analyte, the method comprising:

forming a substrate for surface-enhanced Raman scattering according to the method of claim 9;

transferring the substrate on an optical fiber;

placing the substrate into the analyte; and

recording surface-enhanced Raman scattering signals from the analyte.