Schottky diode
First Claim
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1. A semiconductor device comprising:
- a drift layer having a first surface with an active region and a plurality of junction barrier element recesses, the drift layer being doped with a doping material of a first conductivity type and associated with an edge termination region that is substantially laterally adjacent the active region, wherein the edge termination region comprises a plurality of guard rings;
a Schottky layer over the active region of the first surface to form a Schottky junction;
a plurality of first doped regions that extend into the drift layer about corresponding ones of the plurality of junction barrier element recesses wherein the plurality of first doped regions are doped with a doping material of a second conductivity type, which is opposite the first conductivity type, and form an array of junction barrier elements in the drift layer below the Schottky junction; and
a well formed in the drift layer in the edge termination region, the well having the guard rings and being doped with the doping material of the second conductivity type where the plurality of the guard rings are formed in the well, wherein the guard rings are coplanar with the junction barrier element recesses.
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Abstract
The present disclosure generally relates to a Schottky diode that has a substrate, a drift layer provided over the substrate, and a Schottky layer provided over an active region of the drift layer. The metal for the Schottky layer and the semiconductor material for the drift layer are selected to provide a low barrier height Schottky junction between the drift layer and the Schottky layer.
292 Citations
24 Claims
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1. A semiconductor device comprising:
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a drift layer having a first surface with an active region and a plurality of junction barrier element recesses, the drift layer being doped with a doping material of a first conductivity type and associated with an edge termination region that is substantially laterally adjacent the active region, wherein the edge termination region comprises a plurality of guard rings; a Schottky layer over the active region of the first surface to form a Schottky junction; a plurality of first doped regions that extend into the drift layer about corresponding ones of the plurality of junction barrier element recesses wherein the plurality of first doped regions are doped with a doping material of a second conductivity type, which is opposite the first conductivity type, and form an array of junction barrier elements in the drift layer below the Schottky junction; and a well formed in the drift layer in the edge termination region, the well having the guard rings and being doped with the doping material of the second conductivity type where the plurality of the guard rings are formed in the well, wherein the guard rings are coplanar with the junction barrier element recesses. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21, 22, 23, 24)
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Specification