Scalable multi-role surface-wave plasma generator
First Claim
1. A surface-wave plasma source for generating a surface wave plasma, the surface-wave plasma source comprising:
- a microwave launch structure comprising;
a dielectric insulator layer,a patch antenna adjacent the dielectric insulator layer,a conducting baseplate,a microwave signal generator providing a microwave frequency output signal, andan impedance matching feedthrough signally coupling the microwave frequency output signal to the patch antenna,wherein the patch antenna and conducting baseplate are arranged to provide radiating slots in a space comprising a dielectric material between the patch antenna and the conducting baseplate,wherein the microwave signal generator is configured to operate, in accordance with a control loop, to vary a frequency of the microwave frequency output signal, andwherein the microwave signal generator is configured to operate, in accordance with the control loop, to provide a plasma turn-on and an impedance matching in a response time in an order of 1 microsecond to 10 microseconds.
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Abstract
Systems and methods are described herein for generating surface-wave plasmas capable of simultaneously achieving high density with low temperature and planar scalability. A key feature of the invention is reduced damage to objects in contact with the plasma due to the lack of an RF bias; allowing for damage free processing. The preferred embodiment is an all-in-one processing reactor suitable for photovoltaic cell manufacturing, performing saw-damage removal, oxide stripping, deposition, doping and formation of heterostructures. The invention is scalable for atomic-layer deposition, etching, and other surface interaction processes.
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Citations
28 Claims
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1. A surface-wave plasma source for generating a surface wave plasma, the surface-wave plasma source comprising:
a microwave launch structure comprising; a dielectric insulator layer, a patch antenna adjacent the dielectric insulator layer, a conducting baseplate, a microwave signal generator providing a microwave frequency output signal, and an impedance matching feedthrough signally coupling the microwave frequency output signal to the patch antenna, wherein the patch antenna and conducting baseplate are arranged to provide radiating slots in a space comprising a dielectric material between the patch antenna and the conducting baseplate, wherein the microwave signal generator is configured to operate, in accordance with a control loop, to vary a frequency of the microwave frequency output signal, and wherein the microwave signal generator is configured to operate, in accordance with the control loop, to provide a plasma turn-on and an impedance matching in a response time in an order of 1 microsecond to 10 microseconds. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10)
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11. A surface-wave plasma source for generating a surface wave plasma, the surface-wave plasma source comprising:
a microwave launch structure comprising; a dielectric insulator layer, a patch antenna adjacent the dielectric insulator layer, a conducting baseplate, a dielectric channel, formed on an adjacent surface of the patch antenna opposite the dielectric insulator layer, the dielectric channel providing a spacing between the patch antenna and the conducting baseplate, a microwave signal generator providing a microwave frequency output signal, and an impedance matching feedthrough signally coupling the microwave frequency output signal to the patch antenna, wherein the patch antenna and conducting baseplate are arranged to provide radiating slots in a space between the patch antenna and the conducting baseplate, and wherein the dielectric insulator layer is functionally graded in a varying thickness over a surface of the patch antenna. - View Dependent Claims (12, 13, 14, 15)
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16. A surface-wave plasma source for generating a surface wave plasma, the surface-wave plasma source comprising:
a microwave launch structure comprising; a dielectric insulator layer, a patch antenna adjacent the dielectric insulator layer, a conducting baseplate, a microwave signal generator providing a microwave frequency output signal, and an impedance matching feedthrough signally coupling the microwave frequency output signal to the patch antenna, wherein the patch antenna and conducting baseplate are arranged to provide radiating slots in a space comprising a dielectric material between the patch antenna and the conducting baseplate, and wherein the dielectric insulator layer is functionally graded in a varying thickness over a surface of the patch antenna. - View Dependent Claims (17, 18)
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19. A surface-wave plasma source for generating a surface wave plasma, the surface-wave plasma source comprising:
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a microwave launch structure comprising; a dielectric insulator layer, a patch antenna adjacent the dielectric insulator layer, a conducting baseplate, a microwave signal generator providing a microwave frequency output signal, and an impedance matching feedthrough signally coupling the microwave frequency output signal to the patch antenna, wherein the patch antenna and conducting baseplate are arranged to provide radiating slots in a space comprising a dielectric material between the patch antenna and the conducting baseplate, and wherein the surface-wave plasma source utilizes a structure, for gas injection or gas removal under a formation zone of the surface wave plasma, the structure taken from the group consisting of;
a porous dielectric material and a porous metal material. - View Dependent Claims (20, 21, 22, 23)
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24. An integrated photovoltaic module processing station comprising:
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a surface-wave plasma source comprising a plurality of a microwave launch structure, each one of the plurality of the microwave launch structure comprising; a dielectric insulator layer, a patch antenna adjacent the dielectric insulator layer, a conducting baseplate, a dielectric channel, formed on an adjacent surface of the patch antenna opposite the dielectric insulator layer, the dielectric channel providing a spacing between the patch antenna and the conducting baseplate, a microwave signal generator providing a microwave frequency output signal, and an impedance matching feedthrough signally coupling the microwave frequency output signal to the patch antenna, wherein the patch antenna and conducting baseplate are arranged to provide radiating slots in a space comprising a dielectric material between the patch antenna and the conducting baseplate, wherein the microwave signal generator is configured to operate, in accordance with a control loop, to vary a frequency of the microwave frequency output signal; a wafer carrier; and a gaseous precursor and carrier gas injection and pumping subsystem. - View Dependent Claims (25, 26, 27, 28)
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Specification