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CMP pad construction with composite material properties using additive manufacturing processes

  • US 9,873,180 B2
  • Filed: 04/24/2015
  • Issued: 01/23/2018
  • Est. Priority Date: 10/17/2014
  • Status: Active Grant
First Claim
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1. A polishing pad, comprising:

  • a composite polishing pad body comprising;

    one or more first features formed from a first material, wherein the first material comprises a first material composition formed by depositing droplets of a second material and a third material within a plurality of layers that form at least a portion of each of the one or more first features; and

    a base material layer formed from a fourth material, wherein the fourth material comprises a second material composition formed by depositing droplets of a fifth material and a sixth material within a plurality of layers that form at least a portion of the base material layer,wherein the one or more first features extend from the base material layer, and a surface of each of the one or more first features form a polishing surface of the composite polishing pad body.

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