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Fabrication of tungsten MEMS structures

  • US 9,878,901 B2
  • Filed: 03/27/2015
  • Issued: 01/30/2018
  • Est. Priority Date: 04/04/2014
  • Status: Active Grant
First Claim
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1. A method for fabricating a microelectromechanical systems (MEMS) device having a tungsten-based MEMS structure, the method comprising:

  • depositing a tungsten-based material using a grain growth inhibitor material to form a tungsten-based material layer at least two microns thick above an underlying oxide layer without first densifying the oxide layer; and

    etching the tungsten-based material layer to form the tungsten-based MEMS structure.

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