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Method of manufacturing a motion sensor device

  • US 9,880,192 B2
  • Filed: 01/29/2015
  • Issued: 01/30/2018
  • Est. Priority Date: 09/16/2011
  • Status: Active Grant
First Claim
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1. A method comprising:

  • forming a sensing element of a Micro-Electro-Mechanical System (MEMS) device over a substrate;

    bonding a proof mass of the MEMS device over the sensing element, wherein the proof mass is configured to rotate along a rotation axis; and

    forming a protection region between the sensing element and the proof mass, wherein the protection region is configured to prevent the proof mass from hitting the sensing element, wherein in a top view of the MEMS device, the protection region has a first edge substantially flush with a second edge of the proof mass, with the second edge being parallel to a longitudinal direction of the rotation axis, and the second edge being farthest from the rotation axis among all edges of the proof mass, and wherein in the top view, no additional protection region is formed between the protection region and the rotation axis.

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