Method of manufacturing a motion sensor device
First Claim
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1. A method comprising:
- forming a sensing element of a Micro-Electro-Mechanical System (MEMS) device over a substrate;
bonding a proof mass of the MEMS device over the sensing element, wherein the proof mass is configured to rotate along a rotation axis; and
forming a protection region between the sensing element and the proof mass, wherein the protection region is configured to prevent the proof mass from hitting the sensing element, wherein in a top view of the MEMS device, the protection region has a first edge substantially flush with a second edge of the proof mass, with the second edge being parallel to a longitudinal direction of the rotation axis, and the second edge being farthest from the rotation axis among all edges of the proof mass, and wherein in the top view, no additional protection region is formed between the protection region and the rotation axis.
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Abstract
A Micro-Electro-Mechanical System (MEMS) device includes a sensing element, and a proof mass over and overlapping at least a portion of the sensing element. The proof mass is configured to be movable toward the sensing element. A protection region is formed between the sensing element and the proof mass. The protection region overlaps a first portion of the sensing element, and does not overlap a second portion of the sensing element, wherein the first and the second portions overlap the proof mass.
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Citations
20 Claims
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1. A method comprising:
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forming a sensing element of a Micro-Electro-Mechanical System (MEMS) device over a substrate; bonding a proof mass of the MEMS device over the sensing element, wherein the proof mass is configured to rotate along a rotation axis; and forming a protection region between the sensing element and the proof mass, wherein the protection region is configured to prevent the proof mass from hitting the sensing element, wherein in a top view of the MEMS device, the protection region has a first edge substantially flush with a second edge of the proof mass, with the second edge being parallel to a longitudinal direction of the rotation axis, and the second edge being farthest from the rotation axis among all edges of the proof mass, and wherein in the top view, no additional protection region is formed between the protection region and the rotation axis. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10)
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11. A method comprising:
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forming a sensing element of a Micro-Electro-Mechanical System (MEMS) device over a substrate; bonding a proof mass of the MEMS device over the sensing element, wherein the proof mass is configured to rotate around a rotation axis in a first direction in response to an acceleration of the proof mass, and to rotate around the rotation axis in a second direction opposite to the first direction in response to a deceleration of the proof mass; and forming a protection region between the sensing element and the proof mass, wherein the protection region is configured to prevent the proof mass from hitting the sensing element. - View Dependent Claims (12, 13, 14, 15)
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16. A method comprising:
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forming a sensing element of a Micro-Electro-Mechanical System (MEMS) device over a substrate; bonding a proof mass of the MEMS device over the sensing element, wherein the proof mass is configured to rotate along a rotation axis, wherein the proof mass has a first portion and a second portion on opposite sides of the rotation axis, and the first portion is wider than the second portion; and forming a protection region between the sensing element and the proof mass, wherein the protection region is configured to prevent the proof mass from hitting the sensing element, and the protection region is formed of a metal nitride. - View Dependent Claims (17, 18, 19, 20)
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Specification