Lithographic apparatus and device manufacturing method
First Claim
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1. A device manufacturing method comprising:
- providing a liquid to a space between a projection system and a substrate with a liquid supply system, said liquid being confined in said space by a seal member;
projecting a patterned beam of radiation, through said liquid, onto a target portion of the substrate held by a substrate table;
removably positioning a member adjacent to the projection system between the projection system and the substrate table so that a first side of the member faces the projection system and the second side of the member, opposite from the first side, faces the substrate table to isolate the space provided with the liquid, which contacts the first side of the member, from a second space located on the second side of the member, wherein the member is separable from the substrate table and the projection system, and wherein the member is positionable on the substrate table so that the first side is substantially coplanar with a top surface of the substrate table that receives the substrate, andat least partly recovering the liquid from underneath the seal member through a surface of the seal member that faces the substrate, or the top surface of the substrate table or both.
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Abstract
A lithographic projection apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a liquid supply system configured to provide liquid to a space between the projection system and the substrate; and a shutter configured to isolate the space from the substrate or a space to be occupied by a substrate.
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Citations
19 Claims
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1. A device manufacturing method comprising:
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providing a liquid to a space between a projection system and a substrate with a liquid supply system, said liquid being confined in said space by a seal member; projecting a patterned beam of radiation, through said liquid, onto a target portion of the substrate held by a substrate table; removably positioning a member adjacent to the projection system between the projection system and the substrate table so that a first side of the member faces the projection system and the second side of the member, opposite from the first side, faces the substrate table to isolate the space provided with the liquid, which contacts the first side of the member, from a second space located on the second side of the member, wherein the member is separable from the substrate table and the projection system, and wherein the member is positionable on the substrate table so that the first side is substantially coplanar with a top surface of the substrate table that receives the substrate, and at least partly recovering the liquid from underneath the seal member through a surface of the seal member that faces the substrate, or the top surface of the substrate table or both. - View Dependent Claims (2, 3, 4, 5)
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6. A, device manufacturing comprising:
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providing a liquid to a space between a projection system and a substrate with a liquid supply system, said liquid being confined in said space by a seal member; projecting a patterned beam of radiation, through said liquid, onto a target portion of the substrate held by a substrate table; isolating the space from the substrate or a space to be occupied by a substrate with a shutter, wherein the shutter is positionable on the substrate table so that a primary surface of the shutter is substantially coplanar with a top surface of the substrate table that receives the substrate, and at least partly recovering the liquid from underneath the seal member through a surface of the seal member that faces the substrate, or a top surface of the substrate table or both. - View Dependent Claims (7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19)
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Specification