Process for preparing a semiconductor structure for mounting
First Claim
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1. A device comprising:
- a semiconductor structure comprising;
a light emitting layer disposed between an n-type region and a p-type region;
a plurality of voids extending into the n-type region, the light emitting layer, and the p-type region of the semiconductor structure;
an n-electrode metal disposed in the plurality of voids, wherein the n-electrode metals extends to an edge of the device;
a reflective metal disposed on the p-type region;
a p-electrode metal disposed on the reflective metal; and
a support material disposed in the plurality of voids, wherein a surface of the device is planar, wherein the planar surface of the device includes a surface of the support material, a surface of the n-electrode metal, and a surface of the p-electrode metal.
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Abstract
A process for preparing a semiconductor structure for mounting to a carrier is disclosed. The process involves causing a support material to substantially fill a void defined by surfaces formed in the semiconductor structure and causing the support material to solidify sufficiently to support the semiconductor structure when mounted to the carrier.
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Citations
18 Claims
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1. A device comprising:
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a semiconductor structure comprising; a light emitting layer disposed between an n-type region and a p-type region; a plurality of voids extending into the n-type region, the light emitting layer, and the p-type region of the semiconductor structure; an n-electrode metal disposed in the plurality of voids, wherein the n-electrode metals extends to an edge of the device; a reflective metal disposed on the p-type region; a p-electrode metal disposed on the reflective metal; and a support material disposed in the plurality of voids, wherein a surface of the device is planar, wherein the planar surface of the device includes a surface of the support material, a surface of the n-electrode metal, and a surface of the p-electrode metal. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 18)
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14. A method comprising:
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forming a plurality of voids extending into an n-type region, a light emitting layer, and a p-type region of a semiconductor structure in a device, wherein the light emitting layer is disposed between the n-type region and the p-type region; disposing an n-electrode metal in the plurality of voids, wherein the n-electrode metal extends to an edge of the device; disposing a reflective metal on the p-type region; disposing a p-electrode metal on the reflective metal; disposing a support material in the plurality of voids; and forming a planar surface of the device, wherein the planar surface of the device includes a surface of the support material, a surface of the n-electrode metal, and a surface of the p-electrode metal. - View Dependent Claims (15, 16, 17)
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Specification