Fabrication of low defectivity electrochromic devices
First Claim
1. A method of fabricating an electrochromic device, the method comprising:
- a) depositing one or more metal oxide layers on a substrate, the one or more metal oxide layers comprising either an electrochromic material layer or an electrochromic material layer and a counter electrode material layer; and
b) depositing lithium metal onto the one or more metal oxide layers;
wherein the substrate is in a substantially vertical orientation while the lithium metal is deposited on the one or more metal oxide layers.
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Accused Products
Abstract
Prior electrochromic devices frequently suffer from high levels of defectivity. The defects may be manifest as pin holes or spots where the electrochromic transition is impaired. This is unacceptable for many applications such as electrochromic architectural glass. Improved electrochromic devices with low defectivity can be fabricated by depositing certain layered components of the electrochromic device in a single integrated deposition system. While these layers are being deposited and/or treated on a substrate, for example a glass window, the substrate never leaves a controlled ambient environment, for example a low pressure controlled atmosphere having very low levels of particles. These layers may be deposited using physical vapor deposition.
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Citations
20 Claims
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1. A method of fabricating an electrochromic device, the method comprising:
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a) depositing one or more metal oxide layers on a substrate, the one or more metal oxide layers comprising either an electrochromic material layer or an electrochromic material layer and a counter electrode material layer; and b) depositing lithium metal onto the one or more metal oxide layers;
wherein the substrate is in a substantially vertical orientation while the lithium metal is deposited on the one or more metal oxide layers. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20)
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Specification