Memory cell comprising first and second transistors and methods of operating
First Claim
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1. A semiconductor memory cell comprising:
- a bi-stable floating body transistor comprising a back-bias region configured to generate impact ionization when said memory cell is in one of first and second states, and wherein said back-bias region is configured so as not to generate impact ionization when the memory cell is in the other of said first and second states; and
an access device;
wherein said bi-stable floating body transistor and said access device are electrically connected in series.
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Abstract
Semiconductor memory cells, array and methods of operating are disclosed. In one instance, a memory cell includes a bi-stable floating body transistor and an access device; wherein the bi-stable floating body transistor and the access device are electrically connected in series.
220 Citations
14 Claims
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1. A semiconductor memory cell comprising:
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a bi-stable floating body transistor comprising a back-bias region configured to generate impact ionization when said memory cell is in one of first and second states, and wherein said back-bias region is configured so as not to generate impact ionization when the memory cell is in the other of said first and second states; and an access device; wherein said bi-stable floating body transistor and said access device are electrically connected in series. - View Dependent Claims (2, 3, 4, 5)
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6. A semiconductor memory cell comprising:
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a first transistor having a floating body; a buried layer below said floating body, wherein application of voltage on said buried layer maintains a state of said memory cell; and a second transistor; wherein said first transistor having a floating body transistor comprises a back-bias region configured to generate impact ionization when said memory cell is in one of first and second states, and wherein said back-bias region is configured so as not to generate impact ionization when the memory cell is in the other of said first and second states; and wherein said first and second transistors are connected in series.
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7. A semiconductor memory cell comprising:
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a bi-stable floating body transistor; and a floating gate transistor; wherein said bi-stable floating body transistor comprises a back-bias region configured to generate impact ionization when said memory cell is in one of first and second states, and wherein said back-bias region is configured so as not to generate impact ionization when the memory cell is in the other of said first and second states.
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8. A semiconductor memory cell comprising:
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a first bi-stable floating body transistor; and a second bi-stable floating body transistor; wherein said first and second floating body transistors are configured to store complementary charges; and wherein both said first bi-stable floating body transistor and said second bi-stable floating body transistor comprise a back-bias region configured to generate impact ionization when said memory cell is in one of first and second states, and wherein said back-bias region is configured so as not to generate impact ionization when the memory cell is in the other of said first and second states.
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9. A semiconductor memory cell comprising:
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a first transistor having a first body; a second transistor having a second body; a substrate underlying both of said first and second bodies; a buried layer interposed between said substrate and at least one of said first and second bodies; a first source region contacting said first body; a first drain region separated from said first source line region and contacting said first body; a first gate insulated from said first body; an insulating member insulating said first body from said second body; a second source region contacting said second body; a second drain region separated from said second source region and contacting said second body; and a second gate insulated from said second body; wherein said first body is a floating body and said second body is a well region electrically connected to said buried layer; wherein said first body has a first conductivity type selected from p-type conductivity type and n-type conductivity type; wherein said second body has a second conductivity type selected from said p-type conductivity type and n-type conductivity type; and wherein said first conductivity type is different from said second conductivity type. - View Dependent Claims (10, 11, 12, 13)
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14. A semiconductor memory cell comprising:
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a first transistor having a first body; a second transistor having a second body; a substrate underlying both of said first and second bodies; a buried layer interposed between said substrate and at least one of said first and second bodies; a first source region contacting said first body; a first drain region separated from said first source line region and contacting said first body; a first gate insulated from said first body; an insulating member insulating said first body from said second body; a second source region contacting said second body; a second drain region separated from said second source region and contacting said second body; and a second gate insulated from said second body; wherein said semiconductor memory cell comprises a reference cell, said reference cell further comprising; a sense line region spaced apart from said first source region and said first drain region and contacting said first body, wherein said first body has a first conductivity type selected from p-type conductivity type and n-type conductivity type, and wherein said sense line region has said first conductivity type.
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Specification