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Thin film transistor, method of manufacturing the same, and display apparatus

  • US 9,905,699 B2
  • Filed: 11/26/2014
  • Issued: 02/27/2018
  • Est. Priority Date: 12/05/2006
  • Status: Active Grant
First Claim
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1. A thin film transistor, comprising:

  • a gate electrode;

    a first insulating film as a gate insulating film;

    an oxide semiconductor film as a channel layer, said oxide semiconductor film comprising at least one of a Sn—

    In—

    Zn oxide, an In—

    Zn—

    Ga oxide, an In—

    Sn oxide, an In—

    Ga oxide, an In—

    Zn oxide or an In oxide;

    a second insulating film as a protective layer for protecting the channel layer; and

    a source electrode and a drain electrode, whereina part of each of the source electrode and the drain electrode covers the oxide semiconductor film, and another part of each of the source electrode and the drain electrode covers the second insulating film, andeach of the first insulating film and the second insulating film includes a silicon oxide layer, and a film thickness of that part of the second insulating film which is covered with either of the source electrode and the drain electrode is not more than half of a film thickness of the first insulating film.

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