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Apparatus and method of improving beam shaping and beam homogenization

  • US 9,908,200 B2
  • Filed: 09/08/2014
  • Issued: 03/06/2018
  • Est. Priority Date: 07/31/2007
  • Status: Active Grant
First Claim
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1. An apparatus for thermally processing a substrate, comprising:

  • a plurality of energy sources, wherein each energy source is adapted to deliver an energy pulse;

    a first micro-lens array having a plurality of micro-lenses that are adapted to receive at least a portion of each energy pulse;

    a second micro-lens array having a plurality of micro-lenses that are adapted to receive at least a portion of the energy transmitted from the first micro-lens array;

    a first lens that is positioned to receive at least a portion of the energy transmitted from the micro-lenses in the second micro-lens array and transmit the energy received from the second micro-lens array to one or more components that are used to direct the energy received to a surface of the substrate; and

    a variable aberration control lens that is positioned to receive at least a portion of each energy pulse and project an image to the first micro-lens array from the received energy pulses, wherein the variable aberration control lens is configured to reduce an intensity variation between an edge of the image relative to a center of the image by reducing a first intensity at the edge of the image relative to a second intensity at the center of the image.

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