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Workpiece processing chamber having a rotary microwave plasma antenna with slotted spiral waveguide

  • US 9,928,993 B2
  • Filed: 01/30/2015
  • Issued: 03/27/2018
  • Est. Priority Date: 01/07/2015
  • Status: Active Grant
First Claim
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1. A plasma reactor for processing a workpiece comprising:

  • a chamber and a workpiece support surface in said chamber;

    a rotary coupling comprising a stationary stage and a rotatable stage having an axis of rotation;

    a microwave source coupled to said stationary stage;

    a rotation actuator;

    a microwave antenna coupled to said rotation actuator and overlying said chamber, said microwave antenna comprising;

    a floor and a ceiling defining a planar region therebetween;

    a first spiral wall extending between said floor and said ceiling and having a spiral axis corresponding to said axis of rotation, said first spiral wall defining a first spiral conduit having a first conduit end, said first spiral conduit spiraling radially inwardly from the first conduit end in the planar region and making a plurality of revolutions around said spiral axis such that microwave energy fed into the first spiral conduit flows azimuthally through the first spiral conduit;

    first plural ports in said floor spaced apart along the length of said first spiral conduit;

    an axial conduit coupled to said rotatable stage; and

    a distributor waveguide comprising an input coupled to said axial conduit and a first output coupled to said first spiral conduit.

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