Workpiece processing chamber having a rotary microwave plasma antenna with slotted spiral waveguide
First Claim
Patent Images
1. A plasma reactor for processing a workpiece comprising:
- a chamber and a workpiece support surface in said chamber;
a rotary coupling comprising a stationary stage and a rotatable stage having an axis of rotation;
a microwave source coupled to said stationary stage;
a rotation actuator;
a microwave antenna coupled to said rotation actuator and overlying said chamber, said microwave antenna comprising;
a floor and a ceiling defining a planar region therebetween;
a first spiral wall extending between said floor and said ceiling and having a spiral axis corresponding to said axis of rotation, said first spiral wall defining a first spiral conduit having a first conduit end, said first spiral conduit spiraling radially inwardly from the first conduit end in the planar region and making a plurality of revolutions around said spiral axis such that microwave energy fed into the first spiral conduit flows azimuthally through the first spiral conduit;
first plural ports in said floor spaced apart along the length of said first spiral conduit;
an axial conduit coupled to said rotatable stage; and
a distributor waveguide comprising an input coupled to said axial conduit and a first output coupled to said first spiral conduit.
1 Assignment
0 Petitions
Accused Products
Abstract
A microwave antenna includes a first spiral conduit having a first conduit end, first plural ports in a floor of the first spiral conduit spaced apart along the length of the first spiral conduit; an axial conduit coupled to a rotatable stage; and a distributor waveguide comprising an input coupled to the axial conduit and a first output coupled to the first conduit end.
11 Citations
20 Claims
-
1. A plasma reactor for processing a workpiece comprising:
-
a chamber and a workpiece support surface in said chamber; a rotary coupling comprising a stationary stage and a rotatable stage having an axis of rotation; a microwave source coupled to said stationary stage; a rotation actuator; a microwave antenna coupled to said rotation actuator and overlying said chamber, said microwave antenna comprising; a floor and a ceiling defining a planar region therebetween; a first spiral wall extending between said floor and said ceiling and having a spiral axis corresponding to said axis of rotation, said first spiral wall defining a first spiral conduit having a first conduit end, said first spiral conduit spiraling radially inwardly from the first conduit end in the planar region and making a plurality of revolutions around said spiral axis such that microwave energy fed into the first spiral conduit flows azimuthally through the first spiral conduit; first plural ports in said floor spaced apart along the length of said first spiral conduit; an axial conduit coupled to said rotatable stage; and a distributor waveguide comprising an input coupled to said axial conduit and a first output coupled to said first spiral conduit. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10)
-
-
11. A microwave antenna for a plasma reactor, comprising:
-
a floor and a ceiling defining a planar region therebetween; a first spiral wall defining a first spiral conduit and extending between said floor and said ceiling and having a spiral axis and a first conduit end, said first spiral conduit spiraling radially inwardly from the first conduit end in the planar region and making a plurality of revolutions around said axis of rotation such that microwave energy fed into the first spiral conduit flows azimuthally through the first spiral conduit; first plural ports in said floor spaced apart along the length of said first spiral conduit; an axial conduit; and a distributor waveguide comprising an input coupled to said axial conduit and a first output coupled to said first conduit end. - View Dependent Claims (12, 13, 14, 15, 16, 17)
-
-
18. A plasma reactor comprising:
-
a workpiece processing chamber; a first planar spiral waveguide conduit overlying said workpiece processing chamber and having a spiral axis and a first conduit end, said first planar spiral waveguide conduit spiraling radially inwardly from the first conduit end and making a plurality of revolutions around said spiral axis such that microwave energy fed into the first spiral conduit flows azimuthally through the first spiral conduit; first plural ports in said first planar spiral waveguide conduit facing said workpiece processing chamber and spaced apart along the length of said first planar spiral waveguide conduit; an axial conduit; and a distributor waveguide comprising an input coupled to said axial conduit and a first output coupled to said first planar spiral waveguide conduit. - View Dependent Claims (19, 20)
-
Specification