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Method of optimizing an interface for processing of an organic semiconductor

  • US 9,929,215 B2
  • Filed: 04/21/2017
  • Issued: 03/27/2018
  • Est. Priority Date: 07/12/2016
  • Status: Active Grant
First Claim
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1. A method of forming an organic semiconductor comprising:

  • forming a thin film transistor (“

    TFT”

    ) backplane;

    forming a pixel well over the TFT backplane using a photoresist;

    performing a first plasma etch of the pixel well;

    stripping the photoresist in the pixel well;

    performing a second plasma etch of the pixel well;

    performing a first wash of the pixel well;

    exposing the pixel well to ultraviolet light;

    performing a second wash of the pixel well; and

    forming an organic photodiode in the pixel well.

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