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Source mask optimization to reduce stochastic effects

  • US 9,934,346 B2
  • Filed: 12/14/2015
  • Issued: 04/03/2018
  • Est. Priority Date: 01/10/2012
  • Status: Active Grant
First Claim
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1. A method of improving a lithographic process for imaging a portion of a design layout onto a substrate using a lithographic projection apparatus, the method comprising:

  • defining a multi-variable cost function, the multi-variable cost function being a function of a stochastic effect of the lithographic process, the stochastic effect being a function of a plurality of design variables that are characteristics of the lithographic process; and

    reconfiguring, by a hardware computer, one or more of the characteristics of the lithographic process by adjusting one or more of the design variables and evaluating the cost function with the adjusted one or more design variables until a certain termination condition of the cost function is satisfied, wherein the adjusted one or more variables are used to design, control and/or modify an aspect of the lithographic process and/or the lithographic projection apparatus.

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