Source mask optimization to reduce stochastic effects
First Claim
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1. A method of improving a lithographic process for imaging a portion of a design layout onto a substrate using a lithographic projection apparatus, the method comprising:
- defining a multi-variable cost function, the multi-variable cost function being a function of a stochastic effect of the lithographic process, the stochastic effect being a function of a plurality of design variables that are characteristics of the lithographic process; and
reconfiguring, by a hardware computer, one or more of the characteristics of the lithographic process by adjusting one or more of the design variables and evaluating the cost function with the adjusted one or more design variables until a certain termination condition of the cost function is satisfied, wherein the adjusted one or more variables are used to design, control and/or modify an aspect of the lithographic process and/or the lithographic projection apparatus.
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Abstract
Disclosed herein is a computer-implemented method for improving a lithographic process for imaging a portion of a design layout onto a substrate using a lithographic projection apparatus, the method comprising defining a multi-variable cost function, the multi-variable cost function being a function of a stochastic effect of the lithographic process.
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Citations
28 Claims
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1. A method of improving a lithographic process for imaging a portion of a design layout onto a substrate using a lithographic projection apparatus, the method comprising:
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defining a multi-variable cost function, the multi-variable cost function being a function of a stochastic effect of the lithographic process, the stochastic effect being a function of a plurality of design variables that are characteristics of the lithographic process; and reconfiguring, by a hardware computer, one or more of the characteristics of the lithographic process by adjusting one or more of the design variables and evaluating the cost function with the adjusted one or more design variables until a certain termination condition of the cost function is satisfied, wherein the adjusted one or more variables are used to design, control and/or modify an aspect of the lithographic process and/or the lithographic projection apparatus. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21, 22, 23, 24)
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25. A method of increasing a substrate throughput of a lithographic process for imaging a portion of a design layout onto a substrate using a lithographic projection apparatus, the method comprising:
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defining a multi-variable cost function, the multi-variable cost function being a function of a stochastic effect of the lithographic process, and being a function of an exposure time of the substrate in the lithographic projection apparatus, the stochastic effect being a function of a plurality of design variables that are characteristics of the lithographic process; and reconfiguring, by a hardware computer, one or more of the characteristics of the lithographic process by adjusting one or more of the design variables and evaluating the cost function with the adjusted one or more design variables until a certain termination condition of the cost function is satisfied, wherein the adjusted one or more variables are used to design, control and/or modify an aspect of the lithographic process and/or the lithographic projection apparatus. - View Dependent Claims (26, 27)
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28. A computer program product comprising a non-transitory computer readable medium having instructions recorded thereon, the instructions when executed by a computer system configured to cause the computer system to at least:
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define a multi-variable cost function, the multi-variable cost function being a function of a stochastic effect of a lithographic process for imaging a portion of a design layout onto a substrate using a lithographic projection apparatus, the stochastic effect being a function of a plurality of design variables that are characteristics of the lithographic process; and reconfigure one or more of the characteristics of the lithographic process by adjusting one or more of the design variables and evaluating the cost function with the adjusted one or more design variables until a certain termination condition of the cost function is satisfied, wherein the adjusted one or more variables are used to design, control and/or modify an aspect of the lithographic process and/or the lithographic projection apparatus.
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Specification