Semiconductor optical waveguide, method for manufacturing the same, and optical communication device using the same

• US 9,939,581 B2
• Filed: 12/12/2014
• Issued: 04/10/2018
• Est. Priority Date: 12/18/2013
• Status: Active Grant

• Current Assignee: NEC Corporation
• Original Assignee: NEC Corporation
• Inventors: Takahashi, Morio
• Primary Examiner(s): BLEVINS, JERRY M
• Application Number:
  US15/103,708
• Publication Number:
  US 20160341894A1
• Time in Patent Office: 1,215 Days
• Field of Search: 385131
• CPC Class Codes: G02B 2006/12097 Ridge, rib or the like
• CPC Class Codes: G02B 6/122 Basic optical elements, e.g. light-guiding paths
• CPC Class Codes: G02B 6/136 by etching

Abstract

It is difficult to actualize a semiconductor optical waveguide having desired properties that reflect design even when process technology for a semiconductor electronic circuit is applied as is to the production of a semiconductor optical waveguide.

The present invention includes: a substrate; a semiconductor optical waveguide structure arranged on the substrate; a planar region formed around the semiconductor optical waveguide structure on the substrate; and a semiconductor dummy structure that is arranged around the planar region on the substrate and is formed of a plurality of dummy patterns, wherein the semiconductor optical waveguide structure includes a line-symmetric pattern on a plane that is parallel to the substrate; and the plurality of dummy patterns are arranged symmetrically with respect to the symmetry axis of the line-symmetric pattern.

Claims

1. A semiconductor optical waveguide, comprising:

a substrate;

a semiconductor optical waveguide structure arranged on the substrate;

a planar region formed around the semiconductor optical waveguide structure on the substrate; and

a semiconductor dummy structure that is arranged around the planar region on the substrate and is formed of a plurality of dummy patterns, the semiconductor dummy structure being at least arranged at right besides of the semiconductor optical waveguide,

wherein the semiconductor optical waveguide structure comprises a line-symmetric pattern on a plane that is parallel to the substrate; and

the plurality of dummy patterns are arranged symmetrically with respect to a symmetry axis of the line-symmetric pattern, wherein

a dummy pattern that comes in contact with the planar region comprises a shape of a partially cut dummy pattern that does not come in contact with the planar region.

2. The semiconductor optical waveguide according to claim 1, wherein the planar region comprises a field distribution of guided light propagating in the semiconductor optical waveguide.

3. The semiconductor optical waveguide according to claim 1, wherein the plurality of dummy patterns are arranged periodically.

4. The semiconductor optical waveguide according to claim 3, wherein the semiconductor dummy structure is formed by arranging a plurality of dummy patterns with rectangular shapes in a lattice shape.

5. The semiconductor optical waveguide according to claim 3, wherein the semiconductor dummy structure is formed by arranging, in a stripe shape, a plurality of long dummy patterns extending in a longitudinal direction of the symmetry axis.

6. The semiconductor optical waveguide according to claim 1, comprising a plurality of semiconductor optical waveguides and a planar region,

wherein the plurality of dummy patterns are arranged symmetrically with respect to a central line depending on the plurality of semiconductor optical waveguides.

7. The semiconductor optical waveguide according to claim 1, further comprising a second semiconductor dummy structure that is arranged outside the semiconductor dummy structure on the substrate, and is formed of a plurality of dummy patterns arranged at a predetermined density.

8. An optical communication device, comprising the semiconductor optical waveguide according to claim 1.

9. The semiconductor optical waveguide according to claim 2, wherein the plurality of dummy patterns are arranged periodically.

10. The semiconductor optical waveguide according to claim 9, wherein the semiconductor dummy structure is formed by arranging a plurality of dummy patterns with rectangular shapes in a lattice shape.

11. The semiconductor optical waveguide according to claim 9, wherein the semiconductor dummy structure is formed by arranging, in a stripe shape, a plurality of long dummy patterns extending in a longitudinal direction of the symmetry axis.

12. The semiconductor optical waveguide according to claim 2, comprising a plurality of semiconductor optical waveguides and a planar region,

wherein the plurality of dummy patterns are arranged symmetrically with respect to a central line depending on the plurality of semiconductor optical waveguides.

13. The semiconductor optical waveguide according to claim 3, comprising a plurality of semiconductor optical waveguides and a planar region,

wherein the plurality of dummy patterns are arranged symmetrically with respect to a central line depending on the plurality of semiconductor optical waveguides.

14. The semiconductor optical waveguide according to claim 2, further comprising a second semiconductor dummy structure that is arranged outside the semiconductor dummy structure on the substrate, and is formed of a plurality of dummy patterns arranged at a predetermined density.

15. The semiconductor optical waveguide according to claim 3, further comprising a second semiconductor dummy structure that is arranged outside the semiconductor dummy structure on the substrate, and is formed of a plurality of dummy patterns arranged at a predetermined density.

16. A method for manufacturing a semiconductor optical waveguide, comprising:

arranging a first clad layer and a core layer on a substrate;

forming a core pattern by subjecting the core layer to photolithography and etching using a predetermined mask; and

arranging a second clad layer on the formed core pattern,

wherein the mask is formed by;

periodically arranging a plurality of dummy patterns;

removing a dummy pattern in a safety distance range with a predetermined central axis as a center;

rearranging a dummy pattern in a control region that is adjacent to an outside of the safety distance range line-symmetrically with respect to the central axis; and

forming an optical waveguide structure pattern in the safety distance range in such a way that the central axis and a central line of the optical waveguide structure pattern coincide with each other.