Reduction of hotspots of dense features
First Claim
1. A method to adjust line-width roughness (LWR) in a lithographic apparatus, the method comprising:
- receiving a value of LWR and/or image log slope (ILS) for each feature of a plurality of different features of a pattern to be imaged, using a patterning device, onto a substrate in a lithographic process; and
evaluating, by a hardware computer, a cost function comprising a lithographic parameter and the values of LWR and/or ILS to determine a value of the lithographic parameter that (i) reduces a bias between the LWR and/or ILS of the different features, or (ii) reduces a difference in the LWR and/or ILS of the different features between different lithographic apparatuses, or (iii) reduces a difference in the LWR and/or ILS of the different features between different patterning devices, or (iv) any combination selected from (i)-(iii); and
providing electronic data, based on the determined lithographic parameter, for control of an operational parameter of the lithographic apparatus or process.
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Accused Products
Abstract
A method to adjust line-width roughness (LWR) in a lithographic apparatus, the method including receiving a value of LWR and/or image log slope (ILS) for each feature of a plurality of different features of a pattern to be imaged, using a patterning device, onto a substrate in a lithographic process, and evaluating a cost function including a lithographic parameter and the values of LWR and/or ILS to determine a value of the lithographic parameter that (i) reduces a bias between the LWR and/or ILS of the different features, or (ii) reduces a difference in the LWR and/or ILS of the different features between different lithographic apparatuses, or (iii) reduces a difference in the LWR and/or ILS of the different features between different patterning devices, or (iv) any combination selected from (i)-(iii).
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Citations
20 Claims
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1. A method to adjust line-width roughness (LWR) in a lithographic apparatus, the method comprising:
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receiving a value of LWR and/or image log slope (ILS) for each feature of a plurality of different features of a pattern to be imaged, using a patterning device, onto a substrate in a lithographic process; and evaluating, by a hardware computer, a cost function comprising a lithographic parameter and the values of LWR and/or ILS to determine a value of the lithographic parameter that (i) reduces a bias between the LWR and/or ILS of the different features, or (ii) reduces a difference in the LWR and/or ILS of the different features between different lithographic apparatuses, or (iii) reduces a difference in the LWR and/or ILS of the different features between different patterning devices, or (iv) any combination selected from (i)-(iii); and providing electronic data, based on the determined lithographic parameter, for control of an operational parameter of the lithographic apparatus or process. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9)
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10. A method to adjust line-width roughness (LWR) in a lithographic system, the method comprising:
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receiving an image log slope (ILS) value for each of a plurality of different features in a pattern formed by an illumination radiation beam; and tuning, by a hardware computer, a lithographic system parameter to optimize a bias between the image log slope (ILS) values of the different features to reduce line-width roughness (LWR). - View Dependent Claims (11, 12, 13, 14, 15, 16)
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17. A non-transitory data storage medium having a computer program stored therein, the computer program configured to cause a processor to:
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receive a value of line-width roughness (LWR) and/or image log slope (ILS) for each feature of a plurality of different features of a pattern to be imaged, using a patterning device in a lithographic apparatus, onto a substrate in a lithographic process; and evaluate a cost function comprising a lithographic parameter and the values of LWR and/or ILS to determine a value of the lithographic parameter that (i) reduces a bias between the LWR and/or ILS of the different features, or (ii) reduces a difference in the LWR and/or ILS of the different features between different lithographic apparatuses, or (iii) reduces a difference in the LWR and/or ILS of the different features between different patterning devices, or (iv) any combination selected from (i)-(iii); and providing electronic data, based on the evaluated lithographic parameter, for control of an operational parameter of the lithographic apparatus or process. - View Dependent Claims (18, 19, 20)
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Specification