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Reduction of hotspots of dense features

  • US 9,946,166 B2
  • Filed: 04/08/2015
  • Issued: 04/17/2018
  • Est. Priority Date: 05/02/2014
  • Status: Active Grant
First Claim
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1. A method to adjust line-width roughness (LWR) in a lithographic apparatus, the method comprising:

  • receiving a value of LWR and/or image log slope (ILS) for each feature of a plurality of different features of a pattern to be imaged, using a patterning device, onto a substrate in a lithographic process; and

    evaluating, by a hardware computer, a cost function comprising a lithographic parameter and the values of LWR and/or ILS to determine a value of the lithographic parameter that (i) reduces a bias between the LWR and/or ILS of the different features, or (ii) reduces a difference in the LWR and/or ILS of the different features between different lithographic apparatuses, or (iii) reduces a difference in the LWR and/or ILS of the different features between different patterning devices, or (iv) any combination selected from (i)-(iii); and

    providing electronic data, based on the determined lithographic parameter, for control of an operational parameter of the lithographic apparatus or process.

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