Method and apparatus for processing semiconductor work pieces

• US 9,947,562 B2
• Filed: 01/28/2011
• Issued: 04/17/2018
• Est. Priority Date: 08/05/2005
• Status: Active Grant

• Current Assignee: Applied Materials Incorporated
• Original Assignee: Advanced Micro-Fabrication Equipment Inc., Applied Materials Incorporated
• Inventors: Chen, AiHua, Todaka, Ryoji, Yin, Gerald
• Primary Examiner(s): LUND, JEFFRIE ROBERT
• Application Number:
  US13/016,742
• Publication Number:
  US 20110305544A1
• Time in Patent Office: 2,636 Days
• Field of Search: 118715, 118729, 118730, 118733, 15634537, 15634554, 15634555
• CPC Class Codes: C23C 16/458 characterised by the method used for supporting substrates in the reaction chamber
• CPC Class Codes: C23C 16/4582 Rigid and flat substrates, e.g. plates or discs C23C16/4581 takes precedence
• CPC Class Codes: C23C 16/4583 the substrate being supported substantially horizontally
• CPC Class Codes: C23C 16/4584 the substrate being rotated
• CPC Class Codes: H01L 21/6719 characterized by the construction of the processing chambers, e.g. modular processing chambers

Abstract

A processing apparatus for semiconductor work pieces and related methodology is disclosed and which includes a processing chamber having an internal cavity, and which has a plurality of rotatable processing stations positioned therein and wherein the rotatable processing stations each process a semiconductor work piece.

Claims

1. A processing apparatus for semiconductor work pieces, comprising:

a processing chamber having an internal cavity and which has two or more rotatable processing stations within the internal cavity, wherein (i) each of the two or more rotatable processing stations is operable to process a semiconductor work piece, (ii) each of the two or more rotatable processing stations can move upwardly, downwardly, and rotate relative to the processing chamber, (iii) each of the two or more rotatable processing stations defines a passageway for accommodating electrical signal inputs, (iv) each of the two or more processing stations comprises a rotatable shaft, and (v) each of the two or more processing stations is mounted on a common support member, the common support member being coupled to a drive shaft and a motor, the motor being drivingly coupled by the drive shaft to the common support member and operable to move the two or more rotatable processing stations along a vertical travel path;

two or more sealing assemblies which maintain the internal cavity of the processing chamber substantially sealed while the two or more rotatable processing stations move upwardly, downwardly, and rotate;

a cooling apparatus for cooling the two or more sealing assemblies to facilitate the proper operation of the sealing assemblies wherein the cooling apparatus comprises, at least in part, water cooling conduits, and wherein one of the water cooling conduits comprises an externally mounted conduit; and

a heating unit comprising a resistor wire associated with each of the two or more rotatable processing stations.

2. A processing apparatus as claimed in claim 1, wherein each sealing assembly comprises a bellows seal having opposite first and second ends, and which further has a passageway which extends between the first and second ends, and wherein the processing chamber has a bottom surface, and the first end of the bellows is sealably secured to the bottom surface of the processing chamber.

3. A processing apparatus as claimed in claim 2, wherein each rotatable processing station further comprises:

a first outer shell having first and second ends, and defining a passageway extending between the first and second ends, and wherein the second end of the bellows is sealably mounted to the first end of the first outer shell, wherein the shaft extends into the passageway of the first outer shell and the shaft is further rotatable relative thereto; and

a magnetic sealing component mounted on the first outer shell and sealably cooperating with the shaft so as to sealably secure the shaft for rotatable motion relative to the first outer shell and the bellows seal.

4. A processing apparatus as claimed in claim 3, wherein each rotatable processing station further comprises:

a sealing component positioned between the first end of the first outer shell, and the second end of the bellows, so as to facilitate the sealing of the bellows to the first outer shell.

5. A processing apparatus as claimed in claim 4, wherein the cooling apparatus comprises:

a first coolant passageway which is formed in the shaft, and which is positioned, at least in part near the sealing component; and

a second coolant passageway which is formed, in the first outer shell, and which is positioned, at least in part, near the sealing component, and wherein the first and second coolant passageways are coupled in fluid flowing relation one relative to the other by way of the externally mounted conduit.

6. A processing apparatus as claimed in claim 5, comprising:

a second outer shell having opposite first and second ends, and which further has a passageway which extends longitudinally thereof, and between the first and second ends, and wherein first end of the second outer shell is mounted on, and is substantially coaxially aligned relative to, the second end of the first outer shell, and wherein the shaft extends through the second outer shell and is rotatable relative thereto; and

a plurality of sealing components which are received in the passageway of the second outer shell and which sealingly couple the shaft to the second outer shell, and wherein first and second ring gaps are defined between adjacent sealing components, the shaft, and the second, outer shell.

7. A processing apparatus as claimed in claim 6, comprising:

an external coolant source coupled in fluid flowing relation relative to the first ring gap, and wherein the first ring gap and the first coolant passageway are coupled in fluid flowing relation, and wherein the source of the external coolant enters the first coolant passageway after first passing along the first ring gap.

8. A processing apparatus as claimed in claim 7, wherein the externally mounted conduit has opposite first and second ends, and wherein the first coolant passageway is coupled in fluid flowing relation relative to the second ring gap, and wherein the externally mounted conduit has a first end coupled in fluid flowing relation relative to the second ring gap, and the second end of the externally mounted conduit is coupled in fluid flowing relation to the second coolant passageway, and wherein coolant in the first coolant passageway passes by means of the externally mounted conduit to the second coolant passageway.

9. A processing apparatus as claimed in claim 1, comprising:

a support conduit cooperating with and extending longitudinally outwardly relative to the shaft of the respective processing station, wherein the shaft defines a longitudinally disposed passageway extending therethrough; and

an electrical conduit extending through the support conduit and the shaft, and which is electrically coupled to the resistor wire, wherein the electrical conduit delivers electricity to the resistor wire to energize same.