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Method and apparatus for processing semiconductor work pieces

  • US 9,947,562 B2
  • Filed: 01/28/2011
  • Issued: 04/17/2018
  • Est. Priority Date: 08/05/2005
  • Status: Active Grant
First Claim
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1. A processing apparatus for semiconductor work pieces, comprising:

  • a processing chamber having an internal cavity and which has two or more rotatable processing stations within the internal cavity, wherein (i) each of the two or more rotatable processing stations is operable to process a semiconductor work piece, (ii) each of the two or more rotatable processing stations can move upwardly, downwardly, and rotate relative to the processing chamber, (iii) each of the two or more rotatable processing stations defines a passageway for accommodating electrical signal inputs, (iv) each of the two or more processing stations comprises a rotatable shaft, and (v) each of the two or more processing stations is mounted on a common support member, the common support member being coupled to a drive shaft and a motor, the motor being drivingly coupled by the drive shaft to the common support member and operable to move the two or more rotatable processing stations along a vertical travel path;

    two or more sealing assemblies which maintain the internal cavity of the processing chamber substantially sealed while the two or more rotatable processing stations move upwardly, downwardly, and rotate;

    a cooling apparatus for cooling the two or more sealing assemblies to facilitate the proper operation of the sealing assemblies wherein the cooling apparatus comprises, at least in part, water cooling conduits, and wherein one of the water cooling conduits comprises an externally mounted conduit; and

    a heating unit comprising a resistor wire associated with each of the two or more rotatable processing stations.

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