Lithographic apparatus and device manufacturing method

• US 9,964,858 B2
• Filed: 07/23/2015
• Issued: 05/08/2018
• Est. Priority Date: 06/11/2003
• Status: Active Grant

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: ASML Netherlands BV (ASML Holding NV)
• Inventors: De Smit, Joannes Theodoor, Banine, Vadim Yevgenyevich, Bisschops, Theodorus Hubertus Josephus, Dierichs, Marcel Mathijs Theodore Marie, Modderman, Theodorus Marinus
• Primary Examiner(s): Riddle, Christina
• Application Number:
  US14/807,458
• Publication Number:
  US 20150331334A1
• Time in Patent Office: 1,020 Days
• Field of Search: 355 30, 355 52, 355 53, 355 55, 355 67- 77, 430 5, 430 8, 430 22, 430 30, 430311, 430312, 430321, 2504921, 2504922, 25049222, 25049223, 250548
• CPC Class Codes: G03F 7/70341 Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply chemical composition of immersion liquids G03F7/2041
• CPC Class Codes: G03F 7/708 Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
• CPC Class Codes: G03F 7/70858 Environment aspects, e.g. pressure of beam-path gas, temperature pollution aspects G03F7/70916

Abstract

A lithographic apparatus and device manufacturing method makes use of a liquid confined in a reservoir between the projection system and the substrate. Bubbles forming in the liquid from dissolved atmospheric gases or from out-gassing from apparatus elements exposed to the liquid are detected and/or removed so that they do not interfere with exposure and lead to printing defects on the substrate. Detection may be carried out by measuring the frequency dependence of ultrasonic attenuation in the liquid and bubble removal may be implemented by degassing and pressurizing the liquid, isolating the liquid from the atmosphere, using liquids of low surface tension, providing a continuous flow of liquid through the imaging field, and/or phase shifting ultrasonic standing-wave node patterns.

Claims

1. A lithographic projection apparatus comprising:

a substrate table configured to hold a substrate;

a projection system arranged to project a patterned radiation beam onto a target portion of the substrate;

a liquid confinement member surrounding a reservoir fluidly connecting the projection system with the substrate and/or substrate table, the reservoir having a horizontal cross-sectional width smaller than the horizontal cross-sectional width of the substrate, wherein the liquid confinement member comprises an interior surface extending along the reservoir and the liquid confinement member comprises a lower exterior surface facing during exposure toward the substrate and/or substrate table, the lower exterior surface comprising an opening configured to remove liquid from between the liquid confinement member and a surface of the substrate and/or substrate table, wherein the liquid confinement member surrounds a final optical element of the projection system and is separated from a lateral periphery of the final optical element by an open gap such that liquid can flow through the gap to above a bottom surface of the final optical element;

a liquid supply system configured to at least partly fill the reservoir with a liquid; and

a degassing device configured to degas the liquid.

2. The apparatus of claim 1, wherein the degassing device is located upstream of the reservoir and configured to degas the liquid prior to supply to the reservoir.

3. The apparatus of claim 1, wherein the liquid confinement member has an open aperture in a part of the lower exterior surface below a final surface of the projection system and above the substrate table, the open aperture having a cross-sectional width smaller than a cross-sectional width of the substrate, the open aperture configured to allow the liquid to flow therethrough from above the open aperture to below the open aperture, and the open aperture configured to allow an exposure beam to pass therethrough.

4. The apparatus of claim 3, wherein the open aperture comprises a rectangular shape.

5. The apparatus of claim 1, further comprising a seal member extending across a gap between the liquid confinement member and the projection system.

6. The apparatus of claim 1, further comprising an inlet to supply the liquid to the reservoir, the inlet extending substantially horizontally, located above the lower exterior surface, and facing toward a path of an optical axis of the projection system through the reservoir.

7. The apparatus of claim 1, wherein the degassing device comprises a chamber configured to contain the liquid to be degassed, and a pump arranged to extract gas from the chamber.

8. The apparatus of claim 1, wherein the degassing device is arranged to raise a temperature of the liquid.

9. The apparatus of claim 1, further comprising an opening configured to supply a gas under pressure to adjacent liquid in the reservoir.

10. The apparatus of claim 1, further comprising an ultrasonic transducer.

11. The apparatus of claim 10, wherein the ultrasonic transducer is arranged to remove contamination from a part of the apparatus.

12. A lithographic apparatus comprising:

a projection system configured to image a pattern on a substrate;

a table movable with respect to the projection system;

a liquid supply system configured to supply liquid to a space between the projection system and the table;

a liquid confinement member configured to at least partly confine the liquid in the space, the liquid confinement member comprising a lower surface facing during exposure toward the substrate and/or table, the lower surface comprising an opening configured to remove liquid from the space, wherein the liquid confinement member has an open aperture in a part of the lower surface below a final surface of the projection system and above the table, the open aperture having a cross-sectional width smaller than a cross-sectional width of the substrate, the open aperture configured to allow the liquid to flow therethrough from above the open aperture to below the open aperture, and the open aperture configured to allow an exposure beam to pass therethrough;

an inlet to supply the liquid to the space to contact the substrate, the inlet extending substantially horizontally, located above the lower surface of the liquid confinement member, and facing toward a path of an optical axis of the projection system through the space; and

a degassing device to degas the liquid.

13. The apparatus of claim 12, wherein the degassing device is located upstream of the space and configured to degas the liquid prior to supply to the space.

14. The apparatus of claim 12, wherein the open aperture comprises a rectangular shape.

15. The apparatus of claim 12, wherein the liquid confinement member surrounds a final optical element of the projection system and is separated from a lateral periphery of the final optical element by an open gap such that liquid can flow through the gap to above a bottom surface of the final optical element.

16. The apparatus of claim 12, wherein the liquid confinement member is configured to substantially contain the liquid in the reservoir to a region on the substrate and/or table having an area smaller than the area of the substrate, the region surrounded by a gaseous atmosphere.

17. A device manufacturing method, the method comprising:

at least partly filling a reservoir between a projection system of a lithographic apparatus and a movable table with a liquid, the reservoir fluidly connecting the projection system with a substrate and/or the table;

confining the liquid to the reservoir using a liquid confinement member surrounding the reservoir, the reservoir having a horizontal cross-sectional width smaller than the horizontal cross-sectional width of the substrate, wherein the liquid confinement member comprises an interior surface extending along the reservoir and the liquid confinement member comprises a lower exterior surface facing during exposure toward the substrate and/or table, the lower exterior surface comprising an opening;

removing liquid from between the liquid confinement member and a surface of the substrate and/or table using the opening;

projecting a radiation image, via the projection system, through the liquid in the reservoir onto a target portion of a substrate; and

degassing the liquid using a degasser, wherein the degasser is located upstream of the reservoir and the degassing the liquid is performed prior to supply of the liquid to the reservoir.

18. A lithographic projection apparatus comprising:

a substrate table configured to hold a substrate;

a projection system arranged to project a patterned radiation beam onto a target portion of the substrate;

a liquid confinement member surrounding a reservoir fluidly connecting the projection system with the substrate and/or substrate table, the reservoir having a horizontal cross-sectional width smaller than the horizontal cross-sectional width of the substrate, wherein the liquid confinement member comprises an interior surface extending along the reservoir and the liquid confinement member comprises a lower exterior surface facing during exposure toward the substrate and/or substrate table, the lower exterior surface comprising an opening configured to remove liquid from between the liquid confinement member and a surface of the substrate and/or substrate table;

a liquid supply system configured to at least partly fill the reservoir with a liquid; and

a degassing device configured to degas the liquid, wherein the degassing device is located upstream of the reservoir and configured to degas the liquid prior to supply to the reservoir.

19. The apparatus of claim 18, wherein the liquid confinement member has an open aperture in a part of the lower surface below a final surface of the projection system and above the table, the open aperture having a cross-sectional width smaller than a cross-sectional width of the substrate, the open aperture configured to allow the liquid to flow therethrough from above the open aperture to below the open aperture, and the open aperture configured to allow an exposure beam to pass therethrough.

20. The apparatus of claim 18, wherein the liquid confinement member surrounds a final optical element of the projection system and is separated from a lateral periphery of the final optical element by an open gap such that liquid can flow through the gap to above a bottom surface of the final optical element.