Spatially resolved optical emission spectroscopy (OES) in plasma processing
First Claim
1. A method for determining a spatial distribution of plasma optical emission, comprising:
- igniting a plasma in a plasma processing chamber, the plasma processing chamber having a plasma optical emission measurement system, the plasma optical emission measurement system having a controller for controlling the plasma optical emission measurement system;
using the plasma optical emission measurement system, measuring N plasma optical emission spectra integrated along each of N respective non-coincident rays across the plasma processing chamber, where N>
1, each measured optical emission spectrum comprising M wavelengths, where M≥
1selecting, using the controller, an optical intensity distribution function I(r, θ
) comprising a sum of N basis functions Fp(r, θ
)
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Abstract
Disclosed is a method, computer method, system, and apparatus for measuring two-dimensional distributions of optical emissions from a plasma in a semiconductor plasma processing chamber. The acquired two-dimensional distributions of plasma optical emissions can be used to infer the two-dimensional distributions of concentrations of certain chemical species of interest that are present in the plasma, and thus provide a useful tool for process development and also for new and improved processing tool development. The disclosed technique is computationally simple and inexpensive, and involves the use of an expansion of the assumed optical intensity distribution into a sum of basis functions that allow for circumferential variation of optical intensity. An example of suitable basis functions are Zernike polynomials.
19 Citations
19 Claims
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1. A method for determining a spatial distribution of plasma optical emission, comprising:
-
igniting a plasma in a plasma processing chamber, the plasma processing chamber having a plasma optical emission measurement system, the plasma optical emission measurement system having a controller for controlling the plasma optical emission measurement system; using the plasma optical emission measurement system, measuring N plasma optical emission spectra integrated along each of N respective non-coincident rays across the plasma processing chamber, where N>
1, each measured optical emission spectrum comprising M wavelengths, where M≥
1selecting, using the controller, an optical intensity distribution function I(r, θ
) comprising a sum of N basis functions Fp(r, θ
) - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17)
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18. A non-transitory machine-accessible storage medium having instructions stored thereon which cause a controller to perform a method for determining a spatial distribution of plasma optical emission, the method comprising:
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igniting a plasma in a plasma processing chamber, the plasma processing chamber having a plasma optical emission measurement system, the plasma optical emission measurement system having a controller for controlling the plasma optical emission measurement system; using the plasma optical emission measurement system, measuring N plasma optical emission spectra integrated along each of N respective non-coincident rays across the plasma processing chamber, where N>
1, each measured optical emission spectrum comprising M wavelengths, where M≥
1 ;selecting, using the controller, an optical intensity distribution function I(r, θ
) comprising a sum of N basis functions Fp(r, θ
) - View Dependent Claims (19)
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Specification