Semiconductor device and semiconductor device manufacturing method
First Claim
1. A semiconductor device comprising:
- a semiconductor substrate;
a second semiconductor region with a second conduction type that is provided above the semiconductor substrate and includes a first semiconductor region with a first conduction type in a portion thereof;
a third semiconductor region that is provided above the second semiconductor region and has a higher second conduction type impurity concentration than the second semiconductor region; and
a gate trench that penetrates through the third semiconductor region and is provided on top of the first semiconductor region, whereinthe gate trench includes a gate insulating film provided on side walls and a bottom portion of the gate trench and a gate electrode provided in contact with the gate insulating film,the bottom portion of the gate trench is provided in direct contact with the first semiconductor region,the width of the first semiconductor region extends from a bonding interface between the second semiconductor region and the third semiconductor region toward the semiconductor substrate side,the bottom portion of the gate trench is provided lower than a bonding interface between the second semiconductor region and the third semiconductor region, andthe first semiconductor region has a portion that contacts the side walls of the gate trench, andin the second semiconductor region, the second conduction type impurity concentration decreases from the bonding interface toward the semiconductor substrate side.
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Accused Products
Abstract
To more easily form a structure that mitigates the electrical field focus at the bottom portion of the trench gate and prevents decreases and variations in the gate threshold value (Vth), provided is a semiconductor device including a semiconductor substrate; a second semiconductor region with a second conduction type that is provided above the semiconductor substrate and includes a first semiconductor region with a first conduction type in a portion thereof; a third semiconductor region that is provided above the second semiconductor region and has a higher second conduction type impurity concentration than the second semiconductor region; and a gate trench that penetrates through the third semiconductor region and is provided on top of the first semiconductor region. The gate trench includes a gate insulating film provided on side walls and a bottom portion of the gate trench and a gate electrode provided in contact with the gate insulating film.
15 Citations
10 Claims
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1. A semiconductor device comprising:
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a semiconductor substrate; a second semiconductor region with a second conduction type that is provided above the semiconductor substrate and includes a first semiconductor region with a first conduction type in a portion thereof; a third semiconductor region that is provided above the second semiconductor region and has a higher second conduction type impurity concentration than the second semiconductor region; and a gate trench that penetrates through the third semiconductor region and is provided on top of the first semiconductor region, wherein the gate trench includes a gate insulating film provided on side walls and a bottom portion of the gate trench and a gate electrode provided in contact with the gate insulating film, the bottom portion of the gate trench is provided in direct contact with the first semiconductor region, the width of the first semiconductor region extends from a bonding interface between the second semiconductor region and the third semiconductor region toward the semiconductor substrate side, the bottom portion of the gate trench is provided lower than a bonding interface between the second semiconductor region and the third semiconductor region, and the first semiconductor region has a portion that contacts the side walls of the gate trench, and in the second semiconductor region, the second conduction type impurity concentration decreases from the bonding interface toward the semiconductor substrate side. - View Dependent Claims (2, 3, 4, 5, 6, 7)
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8. A semiconductor device manufacturing method comprising:
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epitaxially forming a second semiconductor region with a second conduction type on a semiconductor substrate; epitaxially forming, on top of the second semiconductor region, a third semiconductor region that has a higher second conduction type impurity concentration than the second semiconductor region; and forming a gate trench that penetrates through the third semiconductor region; forming a first semiconductor region with a first conduction type in a portion of the second semiconductor region; and forming a gate insulating film on side walls and a bottom portion of the gate trench and forming a gate electrode in contact with the gate insulating film, wherein the bottom portion of the gate trench is provided in direct contact with the first semiconductor region, the width of the first semiconductor region extends from a bonding interface between the second semiconductor region and the third semiconductor region toward the semiconductor substrate side, the bottom portion of the gate trench is provided lower than a bonding interface between the second semiconductor region and the third semiconductor region, and the first semiconductor region has a portion that contacts the side walls of the gate trench, and in the second semiconductor region, the second conduction type impurity concentration decreases from the bonding interface toward the semiconductor substrate side. - View Dependent Claims (9, 10)
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Specification