Use of dielectric film to reduce resistivity of transparent conductive oxide in nanowire LEDs
First Claim
1. A method of fabricating a light emitting diode (LED) device, comprising:
- forming a layer of a transparent, electrically conductive material over at least a portion of a non-planar surface of the LED device;
depositing a layer of a dielectric material over, and directly on a top surface of at least a portion of the layer of the transparent, electrically conductive material, wherein the layer of the dielectric material has a transmissivity greater than 85% for at least one emission wavelength of the LED device; and
forming a metal contact directly on a top surface of the layer of the transparent, electrically conductive material layer, wherein the metal contact physically contacts a portion of a top surface of the layer of the dielectric material,wherein depositing the layer of dielectric material comprises at least one of;
(a) depositing the layer using a chemical vapor deposition (CVD) process;
(b) depositing the layer at a temperature of 200°
C. or more; and
(c) depositing the layer using one or more chemically active precursors for the dielectric material,wherein the dielectric material layer decreases a resistivity of the layer of transparent, electrically conductive material to a value that is 50% or less than the resistivity of the layer of transparent, electrically conductive material in the device without the dielectric material layer.
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Accused Products
Abstract
Various embodiments include methods of fabricating light emitting diode (LED) devices, such as nanowire LED devices, that include forming a layer of a transparent, electrically conductive material over at least a portion of a non-planar surface of an LED device, and depositing a layer of a dielectric material over at least a portion of the layer of transparent conductive material, wherein depositing the layer of dielectric material comprises at least one of: (a) depositing the layer using a chemical vapor deposition (CVD) process, (b) depositing the layer at a temperature of 200° C. or more, and (c) depositing the layer using one or more chemically active precursors for the dielectric material.
20 Citations
21 Claims
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1. A method of fabricating a light emitting diode (LED) device, comprising:
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forming a layer of a transparent, electrically conductive material over at least a portion of a non-planar surface of the LED device; depositing a layer of a dielectric material over, and directly on a top surface of at least a portion of the layer of the transparent, electrically conductive material, wherein the layer of the dielectric material has a transmissivity greater than 85% for at least one emission wavelength of the LED device; and forming a metal contact directly on a top surface of the layer of the transparent, electrically conductive material layer, wherein the metal contact physically contacts a portion of a top surface of the layer of the dielectric material, wherein depositing the layer of dielectric material comprises at least one of; (a) depositing the layer using a chemical vapor deposition (CVD) process; (b) depositing the layer at a temperature of 200°
C. or more; and(c) depositing the layer using one or more chemically active precursors for the dielectric material, wherein the dielectric material layer decreases a resistivity of the layer of transparent, electrically conductive material to a value that is 50% or less than the resistivity of the layer of transparent, electrically conductive material in the device without the dielectric material layer. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 12, 13, 14, 15, 16, 17)
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9. A method of fabricating a semiconductor device, comprising:
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forming a layer of a transparent, electrically conductive material over at least a portion of the semiconductor device; depositing a layer of a dielectric material over, and directly on a top surface of at least a portion of the layer of the transparent, electrically conductive material, wherein the layer of the dielectric material has a transmissivity greater than 85% for at least one emission wavelength of the LED device; and forming a metal contact directly on a top surface of the layer of the transparent, electrically conductive material layer, wherein the metal contact physically contacts a portion of a top surface of the layer of the dielectric material, wherein depositing the layer of dielectric material comprises at least one of; (a) depositing the layer using a chemical vapor deposition (CVD) process; (b) depositing the layer at a temperature of 200°
C. or more; and(c) depositing the layer using one or more chemically active precursors for the dielectric material; and wherein the dielectric material decreases a resistivity of the transparent, electrically conductive material to a value that is 50% or less of the resistivity of the transparent, electrically conductive material in the device without the dielectric material layer. - View Dependent Claims (10, 11, 18, 19, 20, 21)
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Specification