Chemical control features in wafer process equipment

• US 9,978,564 B2
• Filed: 09/14/2015
• Issued: 05/22/2018
• Est. Priority Date: 09/21/2012
• Status: Active Grant

• Current Assignee: Applied Materials Incorporated
• Original Assignee: Applied Materials Incorporated
• Inventors: Liang, Qiwei, Chen, Xinglong, Chuc, Kien, Lubomirsky, Dmitry, Park, Soonam, Yang, Jang-Gyoo, Venkataraman, Shankar, Tran, Toan, Hinckley, Kimberly, Garg, Saurabh
• Primary Examiner(s): Zervigon, Rudy
• Application Number:
  US14/853,838
• Publication Number:
  US 20160005572A1
• Time in Patent Office: 981 Days
• Field of Search: 118715, 15634533, 15634534
• CPC Class Codes: B05B 1/005 Nozzles or other outlets specially adapted for discharging one or more gases
• CPC Class Codes: B05B 1/18 Roses; Shower heads with means for adding soap or the like E03C1/046; jet regulators E03C1/08
• CPC Class Codes: C23C 16/452 by activating reactive gas streams before their introduction into the reaction chamber, e.g. by ionisation or addition of reactive species
• CPC Class Codes: C23C 16/455 characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
• CPC Class Codes: C23C 16/45561 Gas plumbing upstream of the reaction chamber
• CPC Class Codes: C23C 16/45565 Shower nozzles
• CPC Class Codes: C23C 16/45574 Nozzles for more than one gas
• CPC Class Codes: C23C 16/45582 Expansion of gas before it reaches the substrate
• CPC Class Codes: C23C 16/50 using electric discharges generation and control of plasma in discharge tubes for surface treatment H01J37/32, H01J37/34
• CPC Class Codes: H01J 2237/002 Cooling arrangements of objects being observed or treated H01J2237/2001
• CPC Class Codes: H01J 37/32009 Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources plasma generation in general H05H1/24
• CPC Class Codes: H01J 37/32357 Generation remote from the workpiece, e.g. down-stream
• CPC Class Codes: H01J 37/3244 Gas supply means
• CPC Class Codes: H01J 37/32449 Gas control, e.g. control of the gas flow
• CPC Class Codes: H01J 37/32568 Relative arrangement or disposition of electrodes; moving means
• CPC Class Codes: H01L 21/67069 for drying etching

Abstract

Gas distribution assemblies are described including an annular body, an upper plate, and a lower plate. The upper plate may define a first plurality of apertures, and the lower plate may define a second and third plurality of apertures. The upper and lower plates may be coupled with one another and the annular body such that the first and second apertures produce channels through the gas distribution assemblies, and a volume is defined between the upper and lower plates.

Claims

1. A gas distribution assembly, comprising:

an annular body comprising;

an inner annular wall located at an inner diameter, an outer annular wall located at an outer diameter, an upper surface, and a lower surface;

an upper recess formed in the upper surface;

a lower recess formed in the lower surface;

a first fluid channel defined in the lower surface that is located in the annular body radially inward of the lower recess;

an upper plate coupled with the annular body at the upper recess, wherein the upper plate defines a plurality of first apertures; and

a lower plate coupled with the annular body at the lower recess, and covering the first fluid channel, the lower plate comprising;

a plurality of second apertures defined therein, wherein the second apertures align with the first apertures defined in the upper plate;

a plurality of third apertures defined therein and located between the second apertures;

wherein the upper and lower plates are coupled with one another such that the first and second apertures are aligned to form a channel through the upper and lower plates.

2. The gas distribution assembly of claim 1, further comprising a second fluid channel defined in the lower surface that is located in the annular body radially outward of the first fluid channel, wherein a plurality of ports are defined in a portion of the annular body defining an outer wall of the first fluid channel and an inner wall of the second fluid channel, wherein the plurality of ports are configured to fluidly couple the second fluid channel with the first fluid channel.

3. The gas distribution assembly of claim 2, further comprising a side channel fluidly coupled with the second fluid channel and configured to provide fluid access from the outer annular wall of the annular body.

4. The gas distribution assembly of claim 2, wherein the second fluid channel is located radially inward of the lower recess such that the second fluid channel is covered by the lower plate, and wherein a portion of the lower plate extends into the second channel above a top of the lower recess.

5. The gas distribution assembly of claim 4, wherein the plurality of ports are angled downward from the second fluid channel to the first fluid channel such that the ports are fluidly accessible above the portion of the lower plate extending into the second channel.

6. The gas distribution assembly of claim 1, wherein the first apertures comprise a conical shape of decreasing diameter as the first apertures extend through the upper plate, and wherein the second and third apertures comprise a conical shape of increasing diameter as the second and third apertures extend through the lower plate.

7. The gas distribution assembly of claim 1, wherein each of the second and third apertures comprise at least three sections of different shape or diameter.

8. The gas distribution assembly of claim 1, wherein a plurality of ports are defined by an inner wall of the first fluid channel.

9. The gas distribution assembly of claim 8, wherein the plurality of ports are configured to provide fluid access to an interior volume defined between the upper plate and the lower plate.

10. A gas distribution assembly, comprising:

an annular body comprising;

an inner annular wall located at an inner diameter, an outer annular wall located at an outer diameter, an upper surface, and a lower surface;

an upper plate coupled with the annular body, wherein the upper plate defines a plurality of first apertures;

an intermediate plate coupled with the upper plate, wherein the intermediate plate defines a plurality of second and third apertures, and wherein the second apertures align with the first apertures of the upper plate; and

a lower plate coupled with the annular body and the intermediate plate, comprising;

a plurality of fourth apertures defined therein that align with the first apertures of the upper plate and the second apertures of the intermediate plate to form a first set of fluid channels through the plates,

a plurality of fifth apertures defined therein that align with the third apertures of the intermediate plate to form a second set of fluid channels through the intermediate and lower plates, wherein the second set of fluid channels are fluidly isolated from the first set of fluid channels, and

a plurality of sixth apertures defined therein that form a third set of fluid channels through the lower plate, wherein the third set of fluid channels are fluidly isolated from the first and second set of fluid channels.

11. The gas distribution assembly of claim 10, wherein the lower plate includes an orientation of the fourth, fifth, and sixth apertures such that a majority of fourth apertures are each surrounded by at least four of the fifth apertures and four of the sixth apertures.

12. The gas distribution assembly of claim 11, wherein the fifth apertures are located around the fourth apertures with centers of the fifth apertures at about 90°

intervals from one another about a center of the fourth apertures, and wherein the sixth apertures are located around the fourth apertures with centers of the sixth apertures at about 90°

intervals from one another about the center of the fourth apertures and offset from the fifth apertures by about 45°

.

13. The gas distribution assembly of claim 11, wherein the fifth apertures are located around the fourth apertures with centers of the fifth apertures at about 60°

intervals from one another about a center of the fourth apertures, and wherein the sixth apertures are located around the fourth apertures with centers of the sixth apertures at about 60°

intervals from one another about the center of the fourth apertures and offset from the fifth apertures by about 30°

.