Indium gallium nitride light emitting devices
First Claim
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1. A method of fabricating a light emitting device comprising:
- providing a first substrate having a crystallographic orientation within about 5 degrees of a −
c-plane, the first substrate comprising a bulk gallium nitride substrate, wherein the bulk gallium nitride substrate is a single layer having a top surface of wurtzite GaN;
fabricating an InGaN template by growing an InGaN epitaxial layer having a selected InN composition by hydride vapor phase epitaxy on said bulk gallium nitride such that said InGaN epitaxial layer directly contacts said top surface, wherein said InGaN epitaxial layer has a thickness greater than 4 μ
m and comprises an InN mole fraction greater than 0.5%, wherein the InGaN epitaxial layer is relaxed, having a-axis and c-axis lattice constants within 0.1% of the respective equilibrium lattice constants for a specific indium-containing nitride composition; and
growing an optoelectronic device structure on one of the InGaN template or a derivative of the InGaN template.
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Abstract
InGaN-based light-emitting devices fabricated on an InGaN template layer are disclosed.
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Citations
18 Claims
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1. A method of fabricating a light emitting device comprising:
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providing a first substrate having a crystallographic orientation within about 5 degrees of a −
c-plane, the first substrate comprising a bulk gallium nitride substrate, wherein the bulk gallium nitride substrate is a single layer having a top surface of wurtzite GaN;fabricating an InGaN template by growing an InGaN epitaxial layer having a selected InN composition by hydride vapor phase epitaxy on said bulk gallium nitride such that said InGaN epitaxial layer directly contacts said top surface, wherein said InGaN epitaxial layer has a thickness greater than 4 μ
m and comprises an InN mole fraction greater than 0.5%, wherein the InGaN epitaxial layer is relaxed, having a-axis and c-axis lattice constants within 0.1% of the respective equilibrium lattice constants for a specific indium-containing nitride composition; andgrowing an optoelectronic device structure on one of the InGaN template or a derivative of the InGaN template. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14)
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15. A method of fabricating a light emitting device comprising:
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providing a first substrate having a crystallographic orientation within about 5 degrees of a −
c-plane, the first substrate comprising a bulk gallium nitride substrate, wherein the bulk gallium nitride substrate is a single layer having a top surface;fabricating an InGaN template by growing an InGaN epitaxial layer having a selected InN composition by hydride vapor phase epitaxy on said bulk gallium nitride substrate such that said InGaN epitaxial layer directly contacts said top surface, wherein the InGaN epitaxial layer has a thickness greater than 4 μ
m and comprises an InN mole fraction greater than 0.5%;growing an optoelectronic device structure on a second substrate selected from one of the InGaN template and a derivative of the InGaN template; and wherein the InGaN epitaxial layer is relaxed, having a-axis and c-axis lattice constants within 0.1% of the respective equilibrium lattice constants for a specific indium-containing nitride composition. - View Dependent Claims (16)
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17. A light emitting device made from a process comprising:
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providing a first substrate having a crystallographic orientation within about 5 degrees of a −
c-plane, the first substrate comprising a bulk gallium nitride substrate, wherein the bulk gallium nitride substrate is a single layer having a top surface;fabricating an InGaN template by growing an InGaN epitaxial layer having a selected InN composition by hydride vapor phase epitaxy on said bulk gallium nitride substrate such that said InGaN epitaxial layer directly contacts said top surface, wherein the InGaN epitaxial layer has a thickness greater than 4 μ
m and comprises an InN mole fraction greater than 0.5%;growing an optoelectronic device structure on a second substrate selected from one of the InGaN template and a derivative of the InGaN template; and wherein the InGaN epitaxial layer is relaxed, having a-axis and c-axis lattice constants within 0.1% of the respective equilibrium lattice constants for a specific indium-containing nitride composition. - View Dependent Claims (18)
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Specification