Transparent conducting indium doped tin oxide
First Claim
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1. A method of manufacturing indium tin oxide, the method comprising:
- sputtering indium and tin from a target onto a substrate to form the indium tin oxide over the substrate, the sputtering comprising moving the target relative to the substrate along a path over the substrate,wherein the indium tin oxide film has a thickness in a range of 500 nm to 4 μ
m,wherein the moving of the target comprises moving the target from an end of the path to an other end of the path during the sputtering of the indium and the tin from the target onto the substrate,wherein during the sputtering of the indium and the tin from the target onto the substrate the target does not move substantially past the end of the path or the other end of the path, andwherein the end of the path is over an end of the substrate and the other end of the path is over an other end of the substrate.
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Abstract
A method of manufacturing indium tin oxide includes sputtering indium and tin from a target onto a substrate, the sputtering including moving the target along a path over the substrate. The indium tin oxide may have a sheet resistance less than 0.5 Ω/□. An indium film includes: a first moving target sputtered indium tin oxide layer; a second moving target sputtered indium tin oxide layer on the first moving target sputtered indium tin oxide layer; and a third moving target sputtered indium tin oxide layer on the second moving target sputtered indium tin oxide layer. A transparency includes the indium tin oxide, and a flying vehicle includes the transparency.
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Citations
16 Claims
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1. A method of manufacturing indium tin oxide, the method comprising:
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sputtering indium and tin from a target onto a substrate to form the indium tin oxide over the substrate, the sputtering comprising moving the target relative to the substrate along a path over the substrate, wherein the indium tin oxide film has a thickness in a range of 500 nm to 4 μ
m,wherein the moving of the target comprises moving the target from an end of the path to an other end of the path during the sputtering of the indium and the tin from the target onto the substrate, wherein during the sputtering of the indium and the tin from the target onto the substrate the target does not move substantially past the end of the path or the other end of the path, and wherein the end of the path is over an end of the substrate and the other end of the path is over an other end of the substrate. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13)
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14. A method of manufacturing indium tin oxide, the method comprising:
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sputtering indium and tin from a target onto a substrate to form the indium tin oxide over the substrate, the sputtering comprising moving the target relative to the substrate along a path over the substrate to form a plurality of indium tin oxide layers forming said indium tin oxide, wherein a sheet resistance of the indium tin oxide is less than 0.5 Ω
/□
,wherein the moving of the target comprises moving the target from an end of the path to an other end of the path during the sputtering of the indium and the tin from the target onto the substrate, wherein during the sputtering of the indium and the tin from the target onto the substrate the target does not move substantially past the end of the path or the other end of the path, and wherein the end of the path is over an end of the substrate and the other end of the path is over an other end of the substrate. - View Dependent Claims (15)
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16. A method of manufacturing indium tin oxide, the method comprising:
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sputtering indium and tin from a target onto a substrate to form the indium tin oxide over the substrate, the sputtering comprising moving the target relative to the substrate along a path over the substrate, wherein the moving of the target comprises moving the target from an end of the path to an other end of the path during the sputtering of the indium and the tin from the target onto the substrate, wherein during the sputtering of the indium and the tin from the target onto the substrate the target does not move substantially past the end of the path or the other end of the path, and wherein the end of the path is over an end of the substrate and the other end of the path is over an other end of the substrate.
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Specification