Apparatus operable to perform a measurement operation on a substrate, lithographic apparatus, and method of performing a measurement operation on a substrate
First Claim
1. An apparatus configured to perform a measurement operation on a substrate in accordance with one or more substrate alignment models, wherein the one or more substrate alignment models are selected from a plurality of candidate substrate alignment models;
- and wherein the apparatus comprises an external interface configured to enable the selection of the one or more substrate alignment models from the plurality of candidate substrate alignment models and/or alteration of one or more candidate substrate alignment models of the candidate substrate alignment models, prior to the measurement operation.
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Abstract
Disclosed is an apparatus and method for performing a measurement operation on a substrate in accordance with one or more substrate alignment models. The one or more substrate alignment models are selected from a plurality of candidate substrate alignment models. The apparatus, which may be a lithographic apparatus, includes an external interface which enables selection of the substrate alignment model(s) and/or alteration of the substrate alignment model(s) prior to the measurement operation.
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Citations
20 Claims
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1. An apparatus configured to perform a measurement operation on a substrate in accordance with one or more substrate alignment models, wherein the one or more substrate alignment models are selected from a plurality of candidate substrate alignment models;
- and wherein the apparatus comprises an external interface configured to enable the selection of the one or more substrate alignment models from the plurality of candidate substrate alignment models and/or alteration of one or more candidate substrate alignment models of the candidate substrate alignment models, prior to the measurement operation.
- View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13)
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14. A method of performing a measurement operation on a substrate, the method comprising:
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determining as to which substrate alignment model(s) from a plurality of candidate substrate alignment models would best fit a particular substrate or lot of substrates; selecting one or more substrate alignment models from the plurality of candidate substrate alignment models based upon the determination; and performing the measurement operation on the substrate or lot of substrates in accordance with the selected one or more substrate alignment models; wherein the determining and selecting are performed either per each lot of substrates such that one lot of a particular device manufacturing process has a different substrate alignment model than another lot of the particular device manufacturing process, or per substrate such that one substrate of a lot has a different substrate alignment model than another substrate of the lot.
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15. A non-transitory program carrier comprising machine readable instructions which, when run on a suitable apparatus, cause the apparatus to:
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determine as to which substrate alignment model(s) from a plurality of candidate substrate alignment models would best fit a particular substrate or lot of substrates; select one or more substrate alignment models from the plurality of candidate substrate alignment models based upon the determination; and cause performance of a measurement operation on the substrate or lot of substrates in accordance with the selected one or more substrate alignment models, wherein the determination and selection are performed either per each lot of substrates such that one lot of a particular device manufacturing process can have a different substrate alignment model than another lot of the particular device manufacturing process, or per substrate such that one substrate of a lot can have a different substrate alignment model than another substrate of the lot. - View Dependent Claims (16, 17, 18, 19, 20)
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Specification