×

Process window optimizer

  • US 9,990,451 B2
  • Filed: 02/09/2015
  • Issued: 06/05/2018
  • Est. Priority Date: 02/12/2014
  • Status: Active Grant
First Claim
Patent Images

1. A defect determination or prediction method for a device manufacturing process involving processing a pattern onto a substrate, the method comprising:

  • identifying a processing window limiting pattern from the pattern;

    obtaining a measured value of a processing parameter under which the processing window limiting pattern is processed; and

    determining or predicting, using the measured value of the processing parameter, or a value derived therefrom, and using a hardware-computer, an existence, probability of existence, a characteristic, or a combination thereof, of a defect produced from the processing window limiting pattern with the device manufacturing process.

View all claims
  • 2 Assignments
Timeline View
Assignment View
    ×
    ×