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Power supply device for plasma processing

  • US 9,997,903 B2
  • Filed: 11/09/2015
  • Issued: 06/12/2018
  • Est. Priority Date: 02/17/2009
  • Status: Active Grant
First Claim
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1. A power supply device for plasma processing, wherein electric arcs may occur, comprisinga power supply circuit for generating a voltage across output terminals,said output terminals being for connection to a plasma processing chamber by means of conductors,an interrupting switch connected between said power supply circuit and one of said output terminals for interrupting the power supply to said plasma processing chamber in case of the occurrence of an arc, anda controller for controlling the power supply circuit and the first switch, such that, in an event of an arc, the first switch is opened and kept in the open state for a time interval to quench the arc and the power supply circuit is switched off in the event that the arc is still burning after actuating the first switch a number of times, said controller being configured to determine at least one delay parameter by means of a self-adaptive process, the delay parameter defining the time when, in an event of an arc, at least one of the power supply circuit and the first switch is switched on or switched off.

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