Electrode cover for a plasma processing apparatus
First Claim
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1. The ornamental design for electrode cover for a plasma processing apparatus, as shown.
2 Assignments
0 Petitions
Accused Products
88 Citations
1 Claim
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1. The ornamental design for electrode cover for a plasma processing apparatus, as shown.
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Current AssigneeHitachi High-Tech Company Limited (Hitachi, Ltd.)
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Original AssigneeHitachi High-Technologies Corporation (Hitachi, Ltd.)
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InventorsUchino, Takeo, Tsubone, Tsunehiko, Makino, Akitaka, Isozaki, Masakazu, Shichida, Hiroyuki
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Primary Examiner(s)Sikder; Selina
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Assistant Examiner(s)Johannes; Thomas J
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Application NumberUS29/236,981Time in Patent Office838 DaysField of SearchD13/182, D13158-177, D13/184, 204/286, 204/297, 205/118, 205/123, 200/1.R, 200/5.R, 200/52.R, 200/315, 200/310, 200/6.A, 200/302.1, 200/308, 200/314, 200/317, 200/11.R, 200/16.BUS Class CurrentD13/182CPC Class CodesN/A
